EXPOSURE OF PHOTOGRAPHIC MATERIALS WITH LASERS

• Document Type: CREST
• Collection: NGA Records (Formerly NIMA)
• Document Number (FOIA) /ESDN (CREST): CIA-RDP78B04770A002600010013-0
• Release Decision: RIPPUB
• Original Classification: S
• Document Page Count: 5
• Document Creation Date: December 28, 2016
• Document Release Date: December 5, 2002
• Sequence Number: 13
• Publication Date: June 4, 1964
• Content Type: REQ

Approved For Re ease 2003/01/28: CIA-RDP78BO477OA002600010013-0
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PAR 216
4 June 64
SUBJECT: Exposure of Photographic Materialswith Lasers
TASK/PROBLEM
1. Determine the manner and degree of the interaction of present
and predictable future photographic films with coherent radiation from
laser sources in red and near IR spectrum ranges.
25X1
2. Work on this project was started in March 1964. The experimental
work was begun with a laboratory setup consisting of the comierical laser
with a housing unit, a variety of optical elements for beam control, and a
film holder. This setup, which is mounted on an optical bench, is schematically
shown in Fig. 1.
3. Exploratory and confirmation exposures have been made on Kodak
Type 8401 Pan -X Aerecon Film with both 25X1
helium-noon gas lasers. A single film has been used to restrict the number
of variables in the experiments. The important observations in these experi-
ments appear to bet
a. There is adequate energy available to flash panchormatic film,
.Exposure'times of 1/100 to 1/200 second produce flash densities greater
than 1.0, using a divergent beam,
b. It seems impossible to produce a uniform flash that is free
from mottle. The pattern varies with the two ends of the laser and appears
to come from surface imperfections in the partially reflecting end mirrors.
Exposure A. Figure 2, shows an example of this pattern at the edge of the
spot.
c. Dust particles on the diverging optics produce enlarged
Newton Rings as illustrated in Exposure B' Figure 2. Special care may
be required to eliminate dust and scratches on any optics in the laser beam.
ocess gamma, using Type 8401 film, from lase
is significantly lower s eri illumination,
SECRET
own in Figure 3.
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Declass Review by
NIMA/DOD
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Approved For F e ease 2003/01/ ECCIRAETP78B0477 02600010013-0 PAR 216
4 June 1964
TYPICAL LENS AZP-ANQ EMENT
HOUSING, TO ENLARGE $EAM DIAMETER-
UNIT
SH U- TEP,
OPTIC, I
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 Approved For Release 2003/01/28 : CIA-RDP78B04770A002600010013-0
SECRET
PAR 216
4 June 1964
Exposure A. Typical pattern in flesh
exposure to laser source.
Exposure B. Newton Ring patterns
produced by dust particles
and by a dot-dash reticle
pattern on optical surfaces
in the laser beam.
GROUP-i
Excluded from automr.ik downgrading
and declassification
Figg 2
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Comparative sensitometric curves for Type 8401 film
exposed to helium-neon laser illumination and to
tungsten (white) light
25X1
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25X1
1 June 64.
e. In projection printing a reticle with the laser source, there
are several discrete positions of the lens for a fixed object-image distance
which produce a discernible image. The quality of the various images is
not the same, and the pattern of the lens positions is not understood.
!i. During the next quarter, a more detailed stud of Item 2e will
be undertaken. Attempts will be made to improve the image quality and to
evaluate the versatility of the technique.
GROUP-1
Excluded from automatic downgrading
and declassification
SECRET
Approved For Release 2003/01/ CIA-RDP78B04770A002600010013-0