JPRS ID: 9913 JAPAN REPORT

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• Collection: JPRS
• Document Number (FOIA) /ESDN (CREST): CIA-RDP82-00850R000400040025-6
• Release Decision: RIF
• Original Classification: U
• Document Page Count: 39
• Document Creation Date: November 1, 2016
• Sequence Number: 25
• Content Type: REPORTS

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JPRS L/9913
14 August 1981
Japan Report
(FOUO 48/81)
F
FB~$ FOREIGN BROADCAST INFORMATION SERVICE
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NOTE
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- newspapers, periodicals and books, but also from news agency
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sources are translated; those from English-language sources
are transcribed or reprinted, with the original phrasing and
ather characteristics retained.
Headlines, editorial reports, and material enclosed in brackets
are supplied by JPRS. Processing indicators such as [Text]
or [Excerpt] in the first line of each item, or following the
last line of a brief, indicate how the original informa.tion was
processed. Where no processing indicator is given, the infor-
mation was summarized or extracted.
Unfamiliar names rendered phonetically or transliterated are
- enclosed in parentheses. Words or names preceded by a ques-
tion mark and enclosed in parentheses were not clear in the
original but have been supplied as appropriate in context.
Other unattributed parenthetical notes within the body of an
item originate with the source. Times within items are as
given by source.
The contents of this publication in no way represent the poli-
cies, views or attitudes of the U.S. Government.
COPYRIGHT LAWS AND REGULATIONS GOVERNING OWiVERSHIP OF
MATERIALS REPRODUCED HEREIN REQUIRE THAT DISSEMINATION
OF THIS PUBLICATION BE RESTRICTED FOR OFFICIAL USE OiNLY.
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JPRS L/9913
14 August 1981
.
JAPAN REPORT
(FOUO 48/81) ,
CONTENTS
ECONOMIC
Mazda Srall Cars, Trucks To Be Exported to Libya
(JAPAN ECONOMIC JOURNAL, 21 Jul 81) 1
SCIENCE AND TECHNOLOGY
Current Trends in CMOS RAM Market Described
(NIKKEI EZECTRONTCS, 8 Jun 81) 2
Secrets To Success of Japan's Auto Industry
(Hiroshi Nonaka; NIKKAN KOGY4 SHIMBUN, vaxious dates) 13
Komatsu Receives Orders for Pipe-Layers From Soviet Union
(NIHON KEIZAI SHIMBUN, 7 Jul 81) 21
More Active Government Role Urged in Developing Natural
Resources
(JAPAN ECONOMIC JOURNAL, 21 Jul 81) 22
Oil Firms Face Serious Financial Si.tuation; I,iabilities Gain
Sharply
(JAPAN ECONOMIC JOURNAL, 21 Ju1 81) 24
Six Aluminum Smelters To Join Mitsui Group Froject
(JAPAN ECONOMIC JOURNAZ, 21 Jul 81) 25
MITI Hopes To Form Group To Promote Uranium Enrichment Project
(JAPAN ECONOMIC JOURNAL, 21 Jul 81) 26
MITI Plans To Develop Quality Robots
(JAPAN ECONOMIC JOURNAL, 21 Jul 81) 2'f
Fujitsu Fanuc To Use Fiber Optics for Numerical Contro"1 With Siemens
(JAPAN ECONOMIC JOURNAL, 21 Jul 81) 28
- a - [III - ASIA - 111 FOUO]
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Steady Growth in Exports of Auto Kits for KD Assembly Reported
(JAPAN ECONOMIC JO'iTRNAI,, 21 Jul 81) 29
Semiconductor Companies Eye Greatly Increasing Ssa Demand
(JAPAN ECONONIC JOURNAL, 21 Jul 81) 30
New Way Found
To Sever
Super Thick Steel Platings Under Water
(JAPAN
ECONOMIC
JOURNAL,
21 Jul 81)
31
Nippon Kogaku
Develops
Unique Indicator Film
(JAPAN
ECONOMIC
JOURNAL,
21 Jul 81)
33
Laser Beam Bombardment
Used for
Fi.lming Work on Semiconductors
(JAPAN
ECONONLIC
JOURNAL,
21 Jul 81)
34
Red Light Diode Having Brilliance of Five Times Devised
(JAPAN ECONONIIC JOURNAL, 21 Jul 81) 35
- b -
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ECONOMIC
MAZDA SMALL CARS, TRUCKS TO BE EXPORTED TO LIBYA
Tokyo JAPAN ECONOMIC JOURNAL in English Vol 19, No 964, 21 Jul 81 p 8
[Text]
Sumitomo ('orp., one of Ja-
pan's lop traders, has won a
provisional order from the
Libyan Government to supply
subcompacl passenger cars
and pickup trucks made by
Toyo Kogyo Co.
The tentalive deal, expected
to be formalized soon, calls for
Sumitomo to export 30,000
NTazda vehicles, worlh some
Y:tO billion.
1'his will be the secoixd auto-
mubile sales to the country
niade hy Japan af'ter a one-
,vear export stoppage that last-
ed until late 1980.
'l'he preceding contcact was
concluded by Nonda Motor Co.
lasl December (ur supply of
soiue ll,o(N) subcompact cars.
'1'he exporis by the Sumitomo-
Toyo tcam and Honda Motor,
taken togelher, will account for
niore thun 40 per cent of
l.ibya's lolal aulomobile im-
pU�tti rstiuiated at some 100,(Nxl
vehicles a year.
'I'he Kaddafi regime of l.ibya
inslituted a trade nalionaliza-
tion policy in 1979 on ils lOth
anniversary. In 1980, it forced
private trading enlerprises to
join statc-run corporations, and
ul the same time, it informed
forcign automakers that il
would not permit them to
export their vehicles lo Libya
unless ttiey put up repairing
costs and supply parts and
components. .
The demand invited a harsh
reaction from the Japanese
automakers and resulted in a
virtual halt oF exports to the
country for the subsequent one
year or so.
Afler mutual concessions,
lionda cansummated a deal
last December to sell some
12 ,uou vehicles. Shipments of
[ionda cars began lasl March.
While sellir.g some 10,000 cars
to East Germany in late May,
Sumitomo doubled iLs car sales
to Chile in the .lanuary-June
{xrioxi over a year earlier.
A Sumitomo spokesman said,
"Successful canclusion of lhe
cleal with Libya will enable the
company to boost ils overall
auto exports in fiscal 1981 by 20
pc:e cenl ovcr a year earlier to
some 450,000 vehicles."
COPYRIGHT: 1981, the Nihon Keizai Shimbun, Inc.
CSO: 4120290
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SCIENCE AND TECHNOLOGY
- CURRENT TRENDS IN CMOS RAM MARKET DESCRIBED
Tokyo NIKKEI ELECTRONICS in Japanese No 266, 8 Jun 81 pp 92-101
[Text] The market for the CMOS [complementary metal oxide semiconductor] RAM
%random access memory) is expanding. The main previous applications were bat-
tery-operated or nonvolatile memory with battery backup during data storage.
These included the ECR (electronic cash register.) and POS (point of sales)
terminals. Recently, in addition to these applications, there has been a ten-
dency to use CMOS for power-source miniaturization. In areas such as office
automation equigment where miniaturization is imperative, ic is essential to
- reduce the size of the power source by eliminating cooling fans and other prob-
lems. For the same reasons, there is a trend toward using the CMOS RAM as the
- main memory of microcomputer systems. One particular application being examined
_ is that of tempurary memory for fast transmission of VTR. There is a large
market even when just one 16 kilo-bit RAM is used per set. Even in applications
to nonvolatile memory, it is expected that the CMOS RAM will be used increasingly
to replace core memory and EPROM (erasable and electrically programmable read-
only memory).
How much will the demand grow? According to the U.S. journal, ELECTRONICS, the
consumption in the United States ;rew 3.8 times from 1979 to 1981. By 1984 it
is expected to increase to 3.5 times the figure for 1981.1 At present, CMOS
devices account for one-fourth of the MOS static RANI market. In 1984 they will
be about one-half (the two together will come close to the dynamic RAM). The
- number of 4 K CMOS RAM's shipped throughout the world grew from 5 million to 13
million in the period 1979 to 1980 (source: Dara Quest Company of the United
States; .*_his is the rate of increase but domestic mauufacturers believe the ab-
- solute number is ~hree or four times this). In 1981, as the movement to the
16 K product begins, a total rate of increase of 40 to 50 percent is expected,
and 70 to 80 percent of this will be Japanese products.
The reasons for this trend include the aforementioned miniaturization of equip-
ment and the strong demand for reduced power dissipation in memory devices. For
this purpose, the power dissipated durinb storage need not be as low as that
during battery backup. However, it will be necessary to bring cost and speed
close to that of the n-MOS static RAM. The target for cost is no more than 1.3
times the ccst of the n-MOS static device. The present 4 K product is 1.3 to
1.5 times that, or close to the goal. The speed of the 16 K product has caught
up with the n-MOS.
2
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NUR UFh7(7A1. Uti!�: ONl.ti'
'Che applications with battery backup wil] also grow, One reason for this is
improvements in batteries. The operating temperature range, reliability, and
capacity are being improved. Development is being carried out to reduce power
dissipation in the CMOS device during standby, and products have appeared with
self-discharging current equal to tha*_ of batteries. Also, lithium batteries
have come into use.
From4Kto 16K
IC manufacturers have also made an effort to develop CMOS devices. In particu-
lar, applications involving batreries axe flourishing. In Japan, miniaturiza-
tion oi machines is very important, so most manufacturers are working on this,
'rhe recent policy of most manufacturers is to make a complete line of products
r.ather than mass-produci.ng a particular kind of inemary device.. The CMOS RAM is
one oF the most important. Most of the large-scale integrated devices of the
Cuture wi].1 probably be CNIOS devices because of restraints on power dissipation.
= The main product at present is the 4 K RAM. The first of these appeared in
- 1977. Some samples of the 16 K product began to come out at the end of 1979.
Many manufacturers got involved dur3ng the latter part of 1980 and 1981. The
~ present is a startup period for this product. Toshiba Corporation and Hitachi
Ltd are already producing between several tens of thousands and more than 100
thousand units per month (the Hitachi product uses CMOS for only the on-chip-
peripheral circuitry; n-MOS with high-resistance load is used for the cell).
Nihon Electric Company, Fujitsu, and Oki Electric will soon move into mass
production. The goal is 100,000 units per month by this fall. The Harris
Corporation of the United States will put out samples this summer and Mitsu-
bishi Electric will do the same this fa11.
These 16 K products are completely different from the previous 4 K product.
Also, the aim o� the 16 K product differs according to the ma.nufacturer. The
unit cost for a complete CMOS device (with CMOS memory cells) is about 3,000
yen when pur.cliased in quantlty. This is five times the cost of the 4 K CMOS
znd 1.5-2 times that of the 16 K n-MOS. Below we will compare the function,
per�ormance, and appl.ication technology of the various products.
.
f
, i ~ -.___..--i�;~ ~ i [ ~ _ ~.I
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: ~ ~ ~ ( . ] :s i;; ~r ~ i~~ A ui:
r r[. V. A rA
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c'i' l!, n[:~, ~ c~. ~]i, I riI{

11 A. (;\I' I ~
8 I: I~ .~ti t~[_ ~ u~ I u, � p~ [ I u. I~~ II
C\I)____~
j . i I I, 1 IJ I I~ I (i I I K � I (d I < I~�1 'li
I _ . . . . _ _ . _ _
rigure 1. Pin configuration of 16 K CMOS RAM. There is a pin configuration
simi].ar to thar of the n-MOS static RAM (d) and one that is oriented to battery
hackup (n). One type of (e) goes into a very low-power dissipation standby mode
only when (;F.p is at a high level. There are other types that go into a.standby
mocie al either. CE1 or CEp .
3
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FIIR OFFI('IAI. Iitil, (DNI.1'
; ii pi ns, ll i t;li-Speed ()pe rat ion I n All Devi.ce5
ln 'I'ahle I, the 1.6 K CMOS RAM product lines are compared. The memory structure
is 'Z K words x 8 bits. The 4 K product has a 1 K by 1 bit and a 4 K by 1 bit
array. AJ_1 use a standard 24-pin DIP package. The 4 K product had either 18
pins and 20 pins. The pin configuration is a standard form of byte-array memory
which is compatible with 16 K EPROI4's (see Figure 1). However, there are three
types of chip selection taXminal which choose the needed product type according
to use.
Looking at function, we see that access time has gotten fastex. It is now about
1.20 to 250 nanoseconds, about the same as the n-MGS, compared to 500 nanoseconds
in conventional products. This is a result of miniaturization of pattern dimen-
sions. The peripheral circuitry on the chip has beEn made faster by manufac-
turers with the objective of replacing the n-MOS device. As a result, products
tiave appeared in which the current consumption in active mode is much greater
than that of the n-MOS. In some products this has been lowered i:,y manipulation
of tre ci.rcuitry. In contrast to the 4 K device, most of these are perfectly
static (only one company produces a synchronous model). There is a varying
range of current consumption during standby depending on the manufacturer. Some
products bring out the special features of CMOS and keep the power consumption
at 1 nanoampere at normal t,emperature, while others are halfway between the CMOS
and n-MOS. This depends on the purpose of the product. With a power source
voltage of 5 volts �10 percent, data can be stored even when the voltage is as
low as 2 volts. Also, there are products with a greater range of operating tem-
perature. These are for outdoor applications such as automatic vending machines.
- The above figures are all taken from data sheets. The focus of concern, however,
is on the actual figures for current consumption during standby snd minimum
activating power source voltage, as well as for noise resistance and reliability.
Three Types of Chip Se'lection
Fram the point of view of function, there are two main types of 16 K devices.
'Che two pin configurations shown in Figure 1 correspond to these two types.
'Che difference is seen in pin No 18 and pin No 20. In Figure 1(d), these pins
are t}ie chip-enable CE and the output-enable OE. In Figure 1(e), they are both
chip-cnable pins, CE1 and EE2; (d) is an extension of (a) and (b) while (e) is
an extension of (c). The'configuration of (a), (b), and (d) is the same as that
of: the n-MOS static RAM. It aims at replacing the n-MOS. When CE is at a high
level, the device goes into the low-power dissipation'standby mode (or the data
storage mode). OE controls output. When it is at a high level, output enters
a hi.gh impedance mode and data is not released. In this way, output conflict
in the bus Is avoided.
Oil the other tiand, (c) and (e) are suited for battery backup applications. This
is because the gate can be eliminated by controlling CE1 and CE2 as shown in
Figure 2. CE1 is used for chip selection. CE2 puts aIl chips into the low-
power d3.ssipation standby mode. This is done simply by applying the high-level
memory-save signal MS to CE2. Conventionally, it was ideal to have four control
signal.s: CEl, CE2, OE, and R/W (read/write). However, because of restraints on
4
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Pabie 1. Examples of the 2 K by 8 bit C`tOS RA11 showing representative characcer;stics. (:ummon char2ctar-
istics are as follows: power source voltage range Vcc - 5 V!10 percent; data yturage volCeRe:
2.0 to 5.5 V(excluding 1016116P); package: standard 24-pin DIP. There are aome differencew be-
tween companies in input level voltage range, input leakage current, and input capacitance.
A 61ank space indicates that data is not available.
Address Current consumDtion (max.) _ Operating Chip
access time Active*' Standby 2 Control temp. sir,e Manufac-
Product number (max.) (ns) (condition) (condition) :dethod range(�C) (mm) turer
Mffi8416 200 60mA 101i A CE,OE -40-+85 5.18x5.66 Fujitsu
(200 from CE 1 ~CE = Vcc ~
~100 from OE ~ Vcct0.2V
MB8417 200 60mA lOuA CE1,CE2 -40-+85 5.18x5.66 Fujitsu
(100 from CE,1 (CEp ~ Vcc-1
1200 from CE~/ Vcc�O.?V f
`tB8418 200 60mA lOuA CE1, CEZ -40-+85 5.18x5.66 Fujitsu
(200 from CE1/CE2) CE1/CE2=Vcc -
(Vcc�0.2V J
HM-6516-9/
250
lOmA
SOOuA
CE,OE
-40-+85/
Harris
-2* 3
240 from CE 1U0
f- 1Mhz, out-
ICE-Vcc~1CC�0.3V,
-55^~+125
(
from OE (cycle
put OmA; in-
~
inputyVcc or OV,
minimum 390)*4
put Vcc or OV
Vcc=2V, outputOmA
H16116P-2
120/150/200
80/70/70mA
2mV/100uA*ll'*12
CE,OE
0-+70
4.16x5.5 Hitachi
-3/-4
(120/150/200 from CE
C ~Vcc-0.2V, in-
1
(
/t^16116LP-2
,80/100/120 from OE
//70/60/60mA
put.lcc-0.2V or
-3/-4 *5
~inputS0.2V ~
HM6117LP-3/
150/200
70mA
100uA*11 '13
CE1,CE2
0--+70
4.76x5.5 Hitachi
-4*5
150/200 froml
CE1?Vcc-0.2V, in-
(CEi,CE2 ~
put2Vcc-0.2V or
s0.2V, or CE23
Vcc-0.2V
M5N5116P/-12/
2001120/150
SQmA
SOuA
CE1,CEZ
0--+70
4.8x6.48 Mitsubishi
-15*`'
200/120/150 1
Z:Vcc-02V, or
~
from CE1CE2)
at CE1~Vcc-
Fnput
2V is fixed close
vcc or o v J
_PD446C/D-3/
150/200
38mA/30mA
100uA*u'7
CE,OE
0-r+70
5.84x6.38 ;TEC
-2
r150/200 from CE
(CE-Vcc)
175/100 from oE
.;PD447C/D-3/
150/200
38mA/30mA
1001,A*n'7
CE1,CE2
0^-+70
5.84x6.38 NEC
-Z
/75/100 from C1~
(CEZ~Vcc)
~150/200 from CE
:.PD449C/D
200
30mA
100uA*ll'7
CE1,CE2
0-+70
5.84x6.38 NEC
(200 from CE1, CEZ)
(CE1,CE2,=Vcc)
KSM5128-12/
120/150/200
67/62/57mA
SOuA*e
CE,3E*9
-30-+85
5.65x6.57 oki
-15
/120/150/200 from CE
1
CE=Vcc-0.2V,input~
-20
~80/100/150 from OE
f
(:0.2V oral!cc-0.2V
TC5516AP/APL
250*10
7pmA*10
30t.A/0.2uA at25�C
, CE1,CE2
-30--+85
5.06x5.77 Toshiba
100 from CEi
1.OvA at 60�C*to
(250 from CEZ)
(CEZ-Vpp-O.SV)
TC5517AP/aPL
250*�0
70mA*l0
30uA/0.2uA at 25�C CE,OE
-30-+85
5.06x5.77 Toshiba
250 from CE
1.0uA at 60�C*10
100 from CE
(
(CE-VDD-O.SV)
(see not
es following page)
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*1. Unless specified, conditions are: shortest cycle time, duty 100 percent,
output OmA.
*2. Unless specified all cperating temperature ranges are given for Vcc=2.0-5.5V
during standby or out of input mode. Chip selection symbols are standardized
as shown above.
*3. Scheduled for sample shipment in summer 1981.
*4. Synchronous; all other products are asynchronous.
*5. n-MOS memory cell with high-resistance load, only on-chip peripheral circuitry
i s CriOS.
*6. Scheduled f or sample shipment in fall 1981.
*7. lOuA when Vcc=3V.
*8. 20uA when Vcc=2V.
*9. Can respond to demand of CE1, CE2
*10. TC5517BP and 5518BP also being readied with 200ns 25mW (standard), and
0.25uW (standard).
*11. When Vcc=5V�10 percent.
*12. 50uA when Vcc=3V.
*13. 30uA when Vcc=3V.

'
i;.CCO
1ji,.-
~
1f.1_,~.,;- ~ ' ( IC l'~:
A . 1~0,
. i
A. I U. Y~ ~~~CCOC~�';' f'U. ~ i
~
~
- ; - --i ~ 
. _..I ; ~
~

. -
ai.;
Fi~ttre 2. The CE1 and CE2 Control System Eliminates the Gate when Battery
Backup Is Used. (From reference materials prepared by NEC)
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the number of pins, not all of these can be used. In the 4 K device, at present,
18-pin configurations (a) and (b) are standard. For CE1 and CE2 control, 20-pin
configuration (c) is used. In 16 K devices, this difference was eliminated.
With 16 K bits, CE2 becomes a negative-logic circuit. It has the advantages of
being readily compatible with TTL and being resistant to noise during data stor-
age (more explanation later). However, manufacturers say that both types are
suitable in practice.
_ There are two specific types of control of CE1 and CE2: the type in which low-
power dissipation standby mode is entered only when CE2 is at a high level, and
the type in which low-power dissipation mode occurs when either CE1 or CE2 is
at a high level. The latter type is best for a large system where the chip is
placed in a matrix and decoded. All chips but the one selected are put into a
- low-power dissipation mode. In the former case, there is no drop in the--power
dissipation of a single line uf chips in the semi-selective mode, wrere CEJ is
high level and CE2 is low. However, in this case, the access time from CE1 be-
comes very short. In the type of control where low-power dissipation occurs when
both CE1 and CE2 are at a high level, the access time from both inputs is the
same. The selection depends on whether priority is given to power dissipation or
speed.
Products which enter low-power dissipation mode when only the chip-enable input
is held at high level have been produced as 16 K devices and the number produced
has risen. The internal circuiLry is designed so that other input gates will be
cut off when there is input at CE2. Originally, 1 K devices were designed this
way. But with 4 K devices, devices without this feature appeared. The address
and data must be fixed close to power source voltage VDD or OV. Even with 16 K
devices, some models of this type remain (see conditions for current consumed
during standby in Table 1). In this case, feedthrough current flows at the input
stage in response to medium-level input.
Most manufac:tu.rers have prepared devices of both types (d) and (e) shown in
Figure 1.
Concern With Actual Pattern of Current Consumed During Standby
Performance requirements for the CMOS RAM are generally rigorous. It must have
~ a wide range of operating temperatures and power source voltages and be highly
resistant to noise. The user requirements for the properties shown in Table 1
are stringent. They emphasize actual performance figures rather than maximum
values. This is an example of good current consumption during standby. When
- used with nonvolatile memory, some users demand as low as 1 microampere at nor-
mal temperature. In general, the actual values are one order of magnitude lower
than the maximum values on the data sheet and one more order of magnitude lower
than that at normal temperature. Figure 3 is a graph showing the distribution
for approximately 1,000 TC5516APL devices which appear in Table 1. The peak
values of the actual devices were under 10 nanoamperes. This val.ue cannot be
measured with a conventional tester. This current is highly dependent on tem-
perature. In nonvolatile memory applications, the proper temperature level is
said to be 25�10�C. That is because the self-discharging current of the battery
is much larger than the CMOS memory current at high temperatures. When used in
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(2)1
~
Ci
, I
,
_
_
~

.i i
.

~
t,;
`
i
~
-
_
_
(3)
Figure 3. Actual Current Consumed During Standby (in the TC5516APL)
Key:
(1) N (devices)
(2) Test conditions: Vpp = 5.5V
CE,) = 5.0 V (=Vpp-0.5 V)
other inputs open
25�C
(3) Current consumed Ipps2 (nA)
a large-capacity memory system, the necessary battery capacity becomes extremely
large if the device is designed for maximum current consumption. Some users make
demands for the average values and dispersion of this current distribution.
The practical values of the power source voltage range are also a matter of
concern. In active mode, the nominal value is 5 volts �10 percent. However,
there are many products which operate at around 2 volts. In such cases, how-
ever, access time increases. The voltage range where data storage is possible
is given as 2.0 to 5.5 volts on the data sheet. Actually, it is reported that
storage can take place at voltages as low as 1.5 volts. Such a figure means
faulty operation.
Resistance to Latch-Up
Latch-up is a particular problem of CMOS. This is a phenomenon which occurs when
the parasitic thyristor in the CMOS structure conducts because of external noise
and large amounts of short-circuit current continue to flow until the power
source is cut off. The 1 K devices were susceptible to input noise. The cause
of this was the diffusion resistance applied to input to prevent electrostatic
breakdown. Forward current flowed in the pn junction (parasitic diode) of the
resistor, triggering the parasitic thyristor. There were also some 4 K devices
in which diffusion resistance was used initially. At present, polysilicon resis-
tance is used, so latch-up does not occur excep_* in the parasitic diode. Since
resistance cannot be applied to the output circuit, the circuit pattern must be
manipulated to increase resistance to latch-up. Manufacturers' know-how is also
app?ied to such matters as ttce spacing of the p-MOS and n-MOS transistors, the
manner of inserting guard rings, the depth of the p well, the density of impuri-
ties, and techniques of equalizing the substrate potential and source potent9.a1.
8
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Noise During Data Storage a Source of Trouble
How to deal with noise when the CMOS RAM is put into low-power dissipation
_ standby mode during data storage is a difficult problem. Recent products have
high-speed response, so when noise in thin whisker-shaped pulses is applied,
errors may occur in reading and writing. Tateishi Electric investi~ated actual
examples of this and techniques for dealing with it in 4 K devices. In its in-
vestigation, the cause was found to be noise due to static electricity. In
Figure 4(a), when the power source voltage drops, CE2 goes to a low level and
the memory enters the data storage mode. If noise pulses are applied to the
CE2 line at this time, the CE2 level is pulled up and this causes faulty ope-
- ration. If fine noise pulses are continously applied, a direct current compo-
nent occurs between the capocitor C1 terminals, and the C2 level is pulled up.
To eliminate this direct current level, a diode was used as shown in Figure
4(b). This circuit is not perfect but has been reported to be e�fective in
practice.
Among the products used were some which were particularly susceptible to the
- influence of static electricity. This characteristic was concentrated in a
particular production lot from a certain company. The voltage of static elec-
tricity which causes faulty operation is one order of magnitude lower than that
of other products. Faulty operation occurs with a finer pulse and at a lower
level than that of other lots. The more these kinds of lots appear and the
greater the dispersion of properties between lots, the greater the problem.
Also, it is desirable for the chip-enable input to be negative logic. That is.
because the margin of the input level is narrow on the low-level side. The
- 16 K devices are made with negative logic. Some manufacturers, as a consequence
of achieving greater speed, have reduced the size of the minimum write-pulse
width. In response, an attempt is being made to increase the minimum write-pulse
width. The analysis of noise properties, including latch-up, is difficult.
0::~ . . c ^
il�:, (:I�:. ;
1. 7 'T
(:N 1) 1' G\1) 1-1~~. ~
...J~~_~ ~ ~ F_�-""'7
~UO n
In) . :%i ~
CB:
. = fl V
~
r------
i
~
i ~
; .i.
i
~
~
~
i
~ M.
~

_ i
9
Figure 4. When tioise is
CE2 during data storage,
errors may occur: (a).
Prevention circuit: (b)
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applied to
read-write
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Timing requires caution in active mode as well. The products shown in Table 1
ar.e mostly completely static (asynchronous). However, there is actually a cor-
relation between the address and control input, and improper timing can cause
writing errors.
Problems have existed with respect to reliability. The current consumed during
data storage sometimes increased abnormally, causing faulty operation; for exam-
ple, reduced voltage in the backup batteries. Also, corrosion sometimes occurred
in the A1 wiring. The former was a result of residual contamination. The latter
was due to a problem with the protective film on the chip surface.
Production Technology D>ffers With the Manufacturer
The production technology used by different companies reflects their differing
objectives. Toshiba and Hitachi have contrasting approaches. A concept accepted
by Toshiba and many other companies is that 2 K by 8 bit MOS static RAM's are
_ divided into two types--the fast, low-cost n-MOS and the medium-speed, low-
power-dissipation CMOS--and there is no intermediate relationship between them.
With this approach, it is necessary to lower the current consur.iption during stand-
by as much as possible in order to bring out the special features of the CMOS RAM.
In contrast to this, Hitachi has taken the policy of supplying one product with
applications of both n-MOS and CMOS. CMOS is used f or the on-chip peripheral
circuitry, and a type of n-MOS with high-resistance load is used for the memory
cell arrAy which takes up most of the chip surface area.3 Current consumption is
lower than that of a perfect CMOS RAM.
In order to keep the current consumed during standby in the nanoampere range, it
is necessary to use a six-transistor CMOS cell. The current is determined by the
MOS transistor cutoff current (subthreshold current) and the pn junction leakage
current. In order to obtain the properties given in Figure 3, Toshiba particu-
larly lowered the leakage current. In order to do this, it eliminated certain
wafer defects, for example, defects which occur iluring formation of the field
oxide film, and heavy metal contamination which occu.-s during p-well fabrication.
The key in this is the point in the fabrication process where heat treatment and
gettering are performed.
The design rules are to shrink the RAM from the 6 to 7 micrometers of the 1 K pro-
duct to 5 micrometers for the 4 K product and 3 micrometers for the 16 K product.
1,hile a perfect CMOS may be as small as 2.5 to 3.5 micrometers, rhe Iiitachi CMOS/
n-MOS will be 3 to 4 micrometers, a little slack. Toshiba uses a 10:1 projection
exposure apparatus. In order to hold down the expansion of chip surface area
without using this exposure apparatus, NEC is using dual-level polysilicon and
Mitsubishi is using dual-level aluminum interconnections.
In a conventional CAiOS structure, a p well is formed in an n substrate and p-MOS
is fabricated on the n substrate and n--MOS in the p well. Hitachi forms a p well
and an n well in a high-resistance substrate and places a large n-MOS cell array
inside the large p well. By this means, high speed can be achieved along with
resistance to alpha-ray soft errors. Mitsubishi uses an n well in a p substrate.
The same process as that for the high-speed n-MOS can be used.
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As shown in Table 1, when a CMOS RAM becomes faster, the power dissipation dur-
- ing active power increases. In order to reduce this, NEC uses the method of
internal dynamic activation.4 A sense amp and clocked control of the bit-line
load are particularly effective. An example of bit-line load is shown in
, Figure 5. When clocked control is not used, if the word line rises and the cell
transfer gate opens, a direct current path occurs as shown in the figure. This
affects the entire cell connected to the word line. This is very serious with
an increased number of bit lines and chips. To prevent this, the bit-line load
must be cut off when the word line rises, as in Figure 5. The internal control
clock activates during address change. Toshiba uses the same concept in its
4 bit Froduct, the TC5514AP. The plan is to use it in the 16 K product as well
(BP version).
Another possible technique for achieving high speed is to reproduce signals mid-
way on the word line (Hitachi and NEC).
Aiming at the Field of High Speed
Hitachi is aiming for high speed with the aforementioned CMOS/n-MOS technology.
Its first product was a 4 K RAM with a maximum access time of 55 ns/70ns. This
January, Hitachi put out a sample of a 16 K by 1 bit RAM, the HM6167, which has
access times of 70 ns/85 ns/100 ns. The power dissipation is markedly lower
than that of the n-MOS. It is housed in a standard 20-pin DIP package 7.6 milli-
meters wide. The surface area is small, 40 percent of the standard 24-pin DIP.
Purthermore, samples of a fast version of the 4 K RAM, the HM6147H, are sche-
duled for shipment this summer.
Intel Corp of the United States will ship samples in the near future of a 4 K by
1 bit RAM with maximum access times of 100 ns/150 ns/200 ns. This is a perfect
CMOS using an n well. Another U.S. company, Integrated Device Technology Inc,
is selling a 2 K by 8 bit CMOS RAM with a maximum access time of 70 ns/90 ns/120 ns.
]F~
; , ;
_ l.p.i
' ~ .
. ' . ~
~?..1
Figure 5. Active current is restrained by internal clocked control. This is
an example of bit-line load control. When th? w:,zd-line potential
rises, the bit-line load is turned off by clock � and the direct
current path shown in the figure is cut off. A sense amp also pro-
vi.des clocked control.
11
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A 64 K CMOS RAM By 1983
[Jhen the move is made from a 16 K to a 64 K priduct, production of pure n-MOS
static RAM's wi.ll probably be reduced. Because of power dissipation restraints,
the peripheral circuitry will have to be CMOS. CMOS/n-MOS and pure CMOS tech-
nology will be used. Manufacturers will probably split into those who are mak-
ing both types and those who make only one. In the area of technology, an n-well
device which has many fabrication processes in common with n-MOS is attracting
notice. With respect to this, some observers say that the pure CMOS with an n
- well will have problems with power dissipation during standby, and the CMOS/
n-MOS combination will have trouble with alpha waves and input undershoot. As
miniaturization proceeds, both the n-MOS and p-MOS will reach the optimum
structure for independence. Samples will be put out during 1981 at the earliest.
Most observers believe that mass production will take place from 1983 on.
(Rikiya Okabe)
REFERENCES
1. "Forecasting the U.S. and European Electronics Market for 1981," NIKKEI
ELECTRONICS, 30 March 1981, No 261, pp 201-233 (table on p 230).
2. Takagi and Nakagaki, "Countermeasures for Electrostatic Noise in CMOS
Memory Cards," Collected Technical Papers of the 1981 Electronic Communi-
cations Society General Conference, presentation No 425, p 2,190, April
1981.
3. Yasui, Makimoto, Masuhara, "High-Speed, Low-Power Dissipation, High Integra-
tion Density MOS Static RAM," NIKKEI ELECTRONICS, 17 March 1980, No 234,
pp 130-150.
4. Akatsuka, Y., Nagahashi, Y., Sasaki, I., Eguchi, K. and Hotta, N., "Fully
Static 16 K RAM Using Dynamic Circuitry Technique," 6th European Solid
State Circuits Conference Digest of Technical Papers, pp 155-157, September
1980.
COPYRIGHT: Nikkei-McGraw-Hill, Inc 1981
9651
CSO: 4105/179
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SCIENCE ANID TECHNOLOGY
SECRETS TO SUCCESS OF JAPAN' S AUTO INIDUSTRY
To6;yo NIZKAN KOGYO SHIMBUN in Japanese 23, 24, 25, 26 Jun 81
[Four-part article by Hiroshi Nonaka, NIKKAN KOGYA reporter]
[23 Jun 81 p 81
[Text] Rising World Appraisal
The 1980's are said to constitute an era of global atito warfare. The joi:iing of
hands (joint ventures) among automakers oF the United States, Europe, and Japan
could be seen as efforts to "survive" in this war. Nonetheless, technological
capability is the basis for survival, General Motors, the king of the world's
carmakers, has invested the enormous sum of 40 billion dollars in research and
development funds for the 1980-84 period toward the development of new-model cars,
because it believes that "technology is the decisive factor." During the past
several years, Japanese cars have won a universal reputation as the "world's top-
level cars." But can they maintain this superiority? Also, what are the factors
that go to make up this superiority? I will take a:look at these questions.
(Reporter Hiroshi Nonaka.)
In February of this year, Nissan Mntors announced in the Japa.nese newspapers that
it had developed the "E"-model engine. A week later, the company received a techni-
cal inquiry from the Ford Company of the United States. "We have never had such a
speedy response. It probably indicates the degree of interest in Japanese auto
technology among foreign carmakers. Nonetheless, we are amazed to receive such at-
tention after only a week." Managing Director Jiro Tanaka, who is Nissan's director
of technology, had a sardonic smile as he spoke.
One does not need to cite the "E"-model engine as an example to emphasize the speed
with which news concerning Japanese technology and new models developed by Japan's
carmakers travel around the world today. Accordi.ng to MOTOR MAGAZINE, a major motor
trade magazine: "Until four or five years ago, news concerning Japanese car model
changes were carried in the world's trade publications a year or so later. More-
over, no mention was made regarding the engines and components. Recently, practi-
cally every motor trade ma.gazine has been carrying news about the new Japanese
models as soon as they are announced. This is indicative of the interest abroad in
Japanese cars." (Hajime Kaida)
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Japanese cars and Japan's auto technology are widely introduced throughout the
world, and a great mass of usera are waiting out there. Consequently, "proud"
foreign manufacturers cannot help but focus attention on Japanese auto technology.
In this sense, the technical cooperation agreement signed in January this year
between Daihatsu T;ogyo and Inocenti Company of Italy could be considered a case
that underscores the high level of Japan's engine technology.
The agreement calls For an annual export shipment by Daihatsu to Inoceriti of 20,000
engines to be used in the compact passenger car "Charade." (1000-cc engine, 3
cylinders) Approval was granted by the Italian Government in late May, and [the
shipment] is scheduled for loading soon. Daihatsu Kogyo has suddenly begun to at-
tract attention from the world's carmakers, including an agreement signed lasC fall
to export 100-200 "Charade" engines annually to Auto Mekanika, a new Greek auto-
maker.
With regard to the blitz announcement last sunmer of a Toyota-Ford partnership,
Fard Company reportedly is strongly interested in the technology of Toyota's sub-
compacts, especially the "Corolla" model. In the background is Ford's interest in
the technology of Daihatsu Kogyo, a partner of Toyota Motors. The Daihatsu people
admit that "Ford representatives made three visits to Japan between late 1979 and
late 1980, meeting with President Sakae Ohara and other Daihatsu officials." The
feasibility of providing technology is said to have been the center of discussion,
but it did not materialize because of Daihatsu's refusal.
However, as a result of the visits to Japa.a, Ford succeeded in obtaining technical
cooperation concerning Toyota's "one box wagon car." This has become an era of
"technical assistance to troubled American carma.kers." (Toyota President Eiji
Toyoda, at a press conference at Narita Airport imnediately following announcement
of the Toyota-Ford partnership on 20 July last year)
The provision of technical cooperation by Japanese automakers is not limited to the
United States. The provision of production techniques and a complete set of facil-
ities by Honda to the established British manufacturer British Leland (an agreement
was signed in December 1979 on the subcompact passenger car "Ballad,") is well
knawn. Also, Nissan Motors is providing the prominent European car manufacturer
Citroen of France wiCh techniques to cope with gas exhaust problems. In January
1980, Citroen, which had been unable to meet exhaust pollution standards in Japan--
the strictest in the world--requested Nissan's cooperation concerning catalytic
technology to be applied to its cars for export to Japan, and it succeeded in ob-
taining an agreement. However, this fact is not lrnawn to the general public. The
reason is that "proud" Citroen feared a decline in its image if it became known
- that it had received technical assistance.
Details of the Nissan-Citroen agreement on technical cooperation are therefore un-
clear. But such cases are not rare in today's auto indusCry. Requests for techni-
cal cooperation continue to pour in from Europe, the United States, Eastern Europe,
and the Soviet Union. But it is questionable whether they will be made public in
case they do materialize. An official in charge of technology for a Tokyo auto-
maker, conducting negotiations on technical cooperation with a leading European
manufacturer, says, "Our company would like to publicize it widely. But the
European manufacturer in a reputedly leading car-producing nation is strongly
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"against publicizing any introduction of foreign technica.l assitance, and has in-
cluded a clause in the agreement forbidding any publicity."
- The world's carmakers are joining hands in many forms in order to survive in the
- war of compact cars in the 1980's. Technical negotiations are part of the phenomenon.
Consequently, many negotiations tend to be held in secret.
One thing which could be stated with certainty is that during the past several
years, Japan's auto technology has suddenly become the center of world attention.
Since when? Why? Clarification of these questions would indicate the fLture trend
of Japan's auto industry.
[24 Jun 81 p 9]
[Text] Improved Durability and Reliability
. Toyota Motors has "matured" to the point where it is now providing Ford, the world's
second largest automaker, with auto production techniques. But it started out by
"copying Ford." (Managing Director Masatoshi Morita) A copy cannot be better than
the original. Naturally, various problems were encountered. Between 1945 and the
mid-1950's, the most frequent problems experienced by not only Toyota but all of
Japan's carmakers were "breakdowns."
In those days, Japan's roads were extremely inferior and the percentage of paved
roads was low. In addition to the imperfect auto technology, the bumpy roads
naturally resulted in frequent breakdowns. Ironically, however, the bad roads con-
tributed to the drastic improvement in the durability of Japanese cars, and this
became an important factor in producing the world's finest, "breakdown-free" cars.
Ma.naging Director Masatoshi Mnrita of Toyota Mntors and Managing Director Jiro
Tanaka of Nissan Motors, technical directors of Japan's top two carmakers, agree:
"The taxis which traveled on bumpy roads performed the ro le of test drivers and gave
us the incentive to improve the performance and durability of our cars." Until the
mid-1950's there were few owner-drivers, and the majority of the cars in demand
were taxis. The taxis traveled on unpaved roads like "kamikaze taxis," somewhat
like the road races held in the mountainous regions of Africa. Just as the road
races tested the performance and durability of cars under severe conditions, the
taxis of the mid-1950's provided a number of important "data":to auto production
experts. This has culminated in the subsequent leap in car quality and performance.
This year's April issue of the popular West German weekly magazine FUNK UHIt L car-
ried a special article entitled, "Which is superior, the Japanese car or the German
Car?" To compare its own cars with Japanese cars is itself unusual in Europe, and
indicates the rising evaluation of Japanese cars. What is especially noteworthy
is the high praise expressed in the article: "Japanese cars are highly reliablia,
but the Toyota is especially good." It thus rates them higher than their own
Mercedes Benz, Opel, and Audi.
Data obtained by the West Gennan car inspection (TW) in 1980 also clearly show
the high reliability of Japanese cars. The West German inspection checked out 26
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items: 8 items on the chassis, 10 items on the brake system, 5 items on lighting,
2 items on exhaust pollution and noise, and 1 item on ridi.ng comfort. The results
of the inspection are provided in terms of an average fault rate (average for all
model cars in an inspection year), 3nd the superiority of a cax is based on how
low its fault rate [is].
According to the results, the West German Mercedes Eenz had the lowest fault rate,
with 3 out of 28 items. Next were Nissan (4 items) and Toyota (5 items), followed
by Toyo Kogyo, Mitsubishi, and Honda--all Japanese makes. Following them were
West German models other than Mercedes Benz, a Swedish model (Volvo), the French
models Peugeot and Renault, and the Italian Fiat.
It is ironic that the inspection results for France and Italy, which severely re-
strict Japanese imports, were inferior. Peugeot and Renault had a fault rate four
times that of the Japanese makes, which have the lowest fault rates. In the case
of Fiat, it was even worse.
One benchmark for car reliability is the marketability of used cars. This is be-
cause the value of cars that have fewer breakdawns and greater durability does not
decline. According to a user poll conducted by the West German motor trade maga-
zine MOT in October (1 Oct 80 issue), used car prices for the Mercedes Benz and BIrb,T
are high, followed by such Japanese makes as the Honda, Mitsubishi, Toyota, and
Nissan models. Here aga.in, Italian and French car prices are generallq low.
"Japanese cars have established a reputation for few critical defects, even as
used cars." (MdTOR MAGAZINE president H.ajime Kaida)
Only some 20 years ago, Japanese cars had a low reputation abroad for reliability
because of frequent troubles. But today their defects are caught immediately, and
major breakdowns are prevented through a driver training control system and a
diagnostic system which accurately pinpoints the trouble. There are now practi-
cally no cases where a driver is compelled to abanclon his car on the road and walk
home on foot.
Additionally, Japanese car production technicians, who seek greater perfection,
are aiming for the "Feller mode analysis." (Shinji Seki, managing director of
Mitsubishi Motors) "Feller mode analysis" is a technical method devised by Che
U.S. National Aeronautical and Space Agency (NASA) in implementing the Apollo
space project. It is applied in order to "anticipate the occurrence of technical
trouble, and to perform checks and doublechecks in order to prevent their occur-
rence.11
[25Jun81p9]
[Text] Fuel-Efficient, Low-Pollution Cars
Late last October, the U.S. Environmental Protection Agency (EPA) announced its
initial list of fuel-efficiency standards for 1981 model cars (put on sale in
October 1930) sold in America. According to the list, the Toyota "Starlet" and
Mitsubishi "Mirage" had the highest fuel efficiency rating among 1300-1600-cc
engine models. They were followed by the Nissan "Sunny," Toyota "Tercel," and
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Toyo Kogyo "Familia." 'Phe Japanese makes were far ahead of such compacts as the
' General Motors "Chevette" and Ford "Escort."
~ Of course, the 1300-cc Starlet and 1400-cc Mirage cannot be corapared on the same
basis with the 1600-cc Chevette and Escort. Still, the Chevette and Escort do not
have becter fuel efficiency than such "top-grade cars" as the 1800-cc Corolla
(Toyota) or the 2000-cc Violet (Nissan). The EPA list clearly shows the out-
standing fuel efficiency of Japanese cars.
The results of "test driving" by taxis in the late 1950's bore fruit in the late
1960's, and Japanese cars began to gain a high reputation for reliability. How-
ever, "it has only been in the past two or three years that they have begun to be
viewed as superior cars at home and abroad." (Sadao Kobayashi, executive director
of Mitsubishi Motors)
The improved reliability of Japanese cars was as yet insufficient as a barometer
for evaluation. From that point on, hawever, world appraisal of Japanese cars
changed rapidly, and they began to be regarded as "outstanding cars." What were
the factors? What was added to their reliability? Regarding the reasons for their
climb to superiority both in reputation and substance, Japanese auto experts say,
"This cannot be discussed without considering antipollution measures." (Kiyoshi
Matsumoto, executive directar of Toyota Motors)
_ In December 1976, the Japan Environmental Protection Agency issued the antipollution
control act for automobiles (enforced in FY 78) despite fierce protests by the auto
industry. Dubbed the "Japanese Muskie Act," it was actually much more restrictive
_ than the Muskie Act. Even today, automakers do not hide their resentment toward
its severity. In reality, the investment necessary for development in order to
pass the strict standards brought an added burden to the automakers and resulted in
higher car prices and increased costs to the consumer. Moreover, the fuel efficiency
and horsepawer of cars immediately following the enforcement of controls were not
very satisfactory.
Nonetheless, the reason that "the development of Japanese cars cannot be discussed
without considering antipollution measures" is because the strict controls helped
to accelerate research and development on engine combustion technology and were
instrumental in its progress. In general, the decrease in NOX (nitrogen oxide)
and hydrocarbons are a tradeoff for fuel efficiency. An increase in the compres-
sion ratio of a reciprocating engine boosts its power and results in better fuel
efficiency. But the temperature also rises and increases the amount of NOX exhaust.
Conversely, a lower compression ratio results in less power and lower fuel ef-
ficiency.
"A drop on one side of the equation results in a rise on the other side." The keys
to solving the tradeoff relationship were i:nproved engine combustion technology and
the development of catalysis technology. The Honda CVCC-II, the Nissan 2-plug
rapid combustiori, and ttie Mitsubishi MCA jet technologies are hi;hly evaluated
throughout the wurld as improved engine technologies. Also, such leading cotn-
bustion tecliniques as the rarified combustioii method used in the light Toyota
engine, the whirlpool COA1bUSt10I1 method using the modified intake port adopted by
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various manufacturers, and the establishment of the electronic-control fuel in-
jectiosi method were successively developed between 1975 an3 1980.
Meanwhile, research and development on catalytic technology, which played a key
role in antipollution measures, came to fruition, and it became possible simultan-
eously to eliminate the three elements of NOX, hydrocarbon, and carbon dioxide
(ternary catalysis). The advent of ternary catalysis meant the attainmerit of low
pollution without depending on combustion technology. It was thus possible to di-
- vert research from that area of engine combustion technology to fuel efficiency
_ and boost in power, resulting in the world's most fuel-efficient, pollution-free
cars.
Realization of low-pollution, fuel-efficient cars through advanced engine combus-
tion technology and catalytic development was an epoch-making event in Japanese auto
manufacturing. Managing Director Ma.satoshi Morita of Toyota N1Qtors said in retro-
spect, regarding the improvement 3.n combustion technology and development of
catalytic technology, "It was the first drastic reform in the history of Japan's
auto industry."
The unfavorable environment of unpaved roads in the mid-1950's played a role in
sharply improving the durability and reliability of Japanese cars, and the world's
strictest antipollution standards in the mid-1970's sparked the creation of fuel-
efficient, low-pollution cars. It could be said that these minus factors, non-
existent in other countries, were converted to the plus side. In that sense,
Japan's top level auto technology could be said to have been "born from an ad-
verse environment and from a persevering national character which was able to over-
come that environment." (Junichi Orino, vice president of Daihatsu Kogyo)
[26Jun81p7]
[Text] Improved Engine Performance
The Ogikubo business office of Nissan Motors is located in a quiet residential dis-
trict of Momoi, Suginami Ward, Tokyo Prefecture. In December 1977, a project team
was formed there. This was the beginning oF the "new engine development project"
headed by Fujihiko Deguchi, deputy director of the second engine design division.
Soon after the project team was formed, three points were established as basic
guidelines for new engine development: 1) reduce the engine weight; 2) improve
the fuel efficiency; 3) reduce friction. The objectives of new engine development
were higher performance and fuel efficiency, based on the premise of a global auto
war in the 1980's. Naturally, it would be necessary to apply the most advanced
technological standards. The project team had selected the three goals for develop-
ment as the most urgent tasks from a number of development themes.
The matrix of today's reciprocating engine was the internal combustion engine de-
veloped in 1885 by two Germans, Gottlieb Daimler and Karl Benz. Today's reciprocat-
ing engine is basically no different from the engine of those days. Thus, "the
engine has undergone a succession of modifications and reached the stage where it
is difficult to improve it any further." (Sadao Kobayashi, executive director of
Mitsubishi Motors) Others hold the extreme view that while "it is impossible to
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"improve the reciprocating engine any further, it is another matter to develop a
totally different engine system." Under such circumstances, the project team pre-
pared detailed designs for the selection of ma.terials for a new engine, for solu-
tions to the problems of noise and pollution resulting from smaller and lighter
engines, for changes in the configuration of the combustion chamber, for a de-
crease in the speed of heat transmission, for the measurement of crankpin friction,
etc. In May 1978, prototypes were made; however, it took another two years to put
them into practical use.
- Takao Noda, of the second engine design division, who was assigned to development,
says in retrospect, "There were many cases where we built prototypes according to
the designs bu*_ failed to achieve the expected results in the tests." For ex-
ample, the configuration oF the intake port designed to accelerate the speed of
heat transmission was cfucial, and Noda says, "We built six precise configuration
- models alone. And we ma.de measurements to see how whirlpools could be produced to
speed up heat transmission. But the distribution of whirlpools would differ, de-
pending on the air volume. Each time we would have to alter the configuration."
This indicates that, despite the major advances in the field of electronics today,
basic research can depend only on trial and error.
It was through such trial and error that the "E"-model engine used in the compact
"Pulsar" model was built. It is 17 kilograms lighter than the previous 1200-cc
engine. It is one of the lightest Japanese engines in its class. Since it is used
exclusively in front-wheel-drive cars, it will play a strategic role in cars built
for world competition by Nissan Motors, which is planning to convert *o front-wheel
drive. It is not surprising that "Ford responded immediately to the "E"-model en-
gine." (Managing Director Jiro Tanaka)
Incidentally, the "E"-model engine has another structural feature which could be-
come "epoch-making" in the history of Japanese auto technology. This is the var-
iable cylinder d.rive system. This is a system which changes the number of cylinders
in use while the car is being driven. When starting the engine or when climbing
uphill, or when a high torque (power to move the car by engine revolution) is de-
manded, such as at a speed in excess of 60 kilometers per hour, all cylinders come
- into use. And at ordinary speeds of 20-50 kilometers per hour, the number of cyl-
inders in use is reduced. It was desi.gned to avoid the use of unnecessary cylinders
at certain speeds, and to economize on fuel consumption.
Actually, this system was introduced last fall by General Motors on its Cadillac
supercar, and it became a world sensation. Japanese automakers have been working
on a similar system as an important theme for more than 10 years. Thus, some tech-
nical experts undoubtedly felt that they were "bsaten to the draw" when General
Motors put its system into practical use.
However, a mere six months later, Nissan Motors--and subsequently Suzuki Motors--
succeeded in building similar systems. Nissan's "E"-madel engine can shift from 4
cylinders to 2 cylinders at braking speed, or stop all 4 cylinders. Al.so, Suzuki
Motors' "variable cylinder engine" (installed on its light comm,:~rcial "carry van")
can shift instantly at high speed from 2 cylinders to 3 cylinders and vice versa.
19
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Wi=n Nissan's variable cylinder conversion limited to braking speed and Suzuki
Motors' variable cylinder system focused on a 2-cycle engine, the prevailing view
is that "tkiey are still not ready." In any case, they are certainly Japan's
first examples in t}ie premature worldwide stage of practical use. Especially,
the Iact that Suzuki Motors, a minor automaker specializing in light cars, has
produced a variable cylinder system indicates the broad range of technological
development achieved by Japan's car manufacturers.
COPYRIGHT: Nikkan Kogyo Shimbunsha 1981
5884
CSO: 4105/200
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SCIENCE AND TECfIlNQLOGY
KOMATSU RECEIVES ORDERS FOR PIPE-LAYERS FROM SOVIET UNION
Tokyo NIHON KEIZAI SHIMBUN in Japanese 7 Jul 81 p 1
[Text] It became known on the 6th that Komatsu Works, which is our country's
biggest con:,truction machine manufacturer, has received orders for pipe-layers
for shipment to the Soviet Union, amounting to 160 mi.llion dollars (about 36
billion yen, at the present yen quotation), and that it has already started
their shipment. This is a business deal, which the Caterpillar Tractor Corpora-
tion of the United States had been negotiating at first with the Soviet Union.
However, as Caterpillar Tractor became unable to export them to the Soviet Union
because of the U.S. Government's policy of banning exports to the Soviet Union,
Komatsu received the orders for them.
In the Soviet Union, the laying of pipelines for oil and natural gas is being
carried out in various places, centering on the Siberian region, and demand for
pipe-layers is increasing. A pipe-layer is a machine which is something like
a bulldozer with a small-size crane attached to its side, and it lifts up the
pipe and then lays them, one by one, while the machine moves foxward. Cater-
pillar Tractor and Komatsu are virtually the only companies in the world, which
manufacture these pipe-layers, and both companies have actual records of exports
to the Soviet Union.
Taking into consideration the delicate international situation surrounding trade
with the Soviet Union, Komatsu has not announced the fact of these large-scale
business talks. However, there is even the possibility that the business talks
for 40-million-dollar worth of pipe-layers, which the Caterpillar Tractor is
naw pushing with the Soviet Union may also be handed over to Komatsu. The
= development of the "Yamburg project," which is a project for the laying of
natural gas pipeline from the Soviet Union to West Europe, is now being watched
with attention, and the moves of Komatsu are also likely to attract attention.
COPYRIGHT: Nihon Keizai Shimbunsha 1981
CSO: 4105/214
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SCIENCE AND TECHNOLOGY
MORE ACTIVE GOVERNMENT ROLE URGED IN DEVELOPING NATURAL RESOURCES
Tokyo JAPAN ECONOMIC JOURNAL in English Vol 19, No 964, 21 Jul 81 p 3
[Text]
Japan Federation of Eco-
danren, headed by Shinpei
Keidanren insists that the
nomic Urganizations (Keidan-
Omota, chairman of Mitsui
and
Mining & Smelting Co.
Government should set up a
system for sharing the develop-
ren ) has worked ouf proposals
calling for the Government to
,
were accepted by the board of
inental risk involved in mining
take more responsibility in
directors of Keidanren late last
projects by private companies
securing overseas natural re-
month.
The natural resources under
in addition to the cooperation
extended by the Metal Mining
sources, such as non-ferrous
coal and lumber for
oil
metals
consideration include oil, coal,
Agency of Japan in research
,
,
the ecotiomic security of Japan.
non-ferrous metals and lumber
for resource development.
After six months of study,
- with an emphasis on non-fer-
Keidanren will also request
headed by Yoshi-
Keidanren
rous metals and lumber be-
that the Government improve
,
hiro Inayama, has come up
cause of the difficulty in devel-
the overseas investment insur-
with various proposals to be
oping these natural resources
ance system so that private
submitted to the Government.
and their poor business per-
corporations can avoid risks
'Chey will call for the Govern-
formance resulting from the
resulting from their own in-
ment to talce a more active role
dull tone of the market.
vestment in overseas countries
in direct negotiations with other
Keidanren will ask the Gov-
and from fluctuation of the for-
governments for developing
ernment to step up its diplo-
eign exchaage rate.
natural resources abroad.
macy on resources in which
It will ask the Government,
The proposals will also ask
governmental agencies will ini-
in more specific terms, to allow
the (=overnment to try to help
tiate negotiations with other
private enterprises to use the
lessen the investment risk in
governments to obtain mining
insurance to invest in countries
overseas development of na-
concessions abroad.
facing political instability.
tural resources by private
approving
tions b
The Japanese non-ferrous
metal industry has increasingly
The overseas investment in-
t b
t
y
corpora
overseas investment insurance
been defeated lately in bidding
surance at presen
canno
e
applied to such countries as
for developmental projects
competilion with international
Iran, Iraq, Zaire and Papua
with any country.
Keidanren will also ask the
major oil �companies and U.S.
major non-ferrous metal com-
New Guinea - all of which are
Covernment in the proposals to
panies.
abundant in oil, copper and
lumber
buy up in principle the da~nes-
With many developing coun-
.
Keidanren will
Furthermore
tic stockpiling oi natural re-
tries nationalizing their mining
,
request that the Export-Import
sources as "the government
stockpiling" and abolish the
of non-ferrous metal ores, it
has become increasingly im-
Bank of Japan extend its loans
i
present "repurchase agree-
portant for the Japanese Gov-
n
directly to foreign companies
the form of buyers' credit or
ment" for non-ferrous metal
ernment to negotiate with the
bank loans when Japanese non-
products.
The proposals were compiled
governments of these develop-
ing countries for opening up
ferrous metal companies are to
the Natural Resources Coun-
b
new business opportunities for
carry out a joint developmental
y
termeasure Committee of Kei-
the domestic industry.
project with the foreign com-
panies.
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As far as the non-ferrous
metal industry is concerned,
the Exim Bank, in most cases,
gives out its loans to Japa-
nese companies in the form
of suppliers' credit sys-
tem. The Japanese noo-fer-
ro'us metal industry, con-
sequently, has to take full re-
sponsibility for the exchange
risk and is currently burdened
with $300 million in deficit
which is the remainder of loans
extended when the dollar was
V 360 at the exchange market.
The domestic non-ferrous
metal industry is faced not only
with these investment and ex-
change risks but also with the
cost for stockpiling natural
resources at home as domestic
demand for such resources is
rather sluggish.
Although its stockpiling of
copper has considerably de-
creased, the industry is still left
with 100,000 tons of zinc. Under
the present agreement, the in-
dustry is reguired to repur-
chase stockpiled resources in-
cluding interest rates three
years after the Government
purchased such resources. And
Keidanren wants the Govern-
ment to buy up the stockpiled
resources. �
COPYRIGHT: 1981, the Nihon Keizai Shimbun, Inc.
CSO: 4120/290
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SCIENCE AND TECHNOLOGY
OIL FIRMS FACE SERIOUS FINANCIAL SITUATION; LIABILITIES GAIN SHARPLY
Tokyo JAPAN ECONOMIC JOURNAL in English Vol 19, No 964, 21 Jul 81 p 6
[Text]
Oil companies' financial posi-
tions have deteriorated rapidly.
Many are operating at loss be-
cause of twin pressure of slow
product oil price hikes and for-
eign exchange losses (caused
by the weak yen in recent
months). The situation is so
bad that of the 34 companies,l0
will witness their cumulative,
carried-over loss surpassing
net worth by the middle of
iiscal 1981.
Effective July 1, they were
curtailing refining of crude oil,
while the Ministry of Interna-
tional Trade & Industry is try-
ing to assist the industry by
planning price guidelines (as
allowed by the Petroleum In-
dustry Law to prevent price
nosedive and skyrocketing).
Despite these measures, the
whole industry fintls it difficult
to turn its operation into prof-
itable one unless the yen gains
strength quickly.
Maruzen Oil Co. is in the
most serious problem. The re-
finer reported Y28.8 billion in
recurring loss, reducing its net
asset to only Y 1,925 million at
the end of March, 1981. Every
month since April, Maruzen
has lost an estimated Y 10 bil-
lion because of failure to have
its Y 7,000 per kiloliter price
hike accepted by all users and
toreign currency exchange
losses.
Maruzen Oil has come up
with business rehabilitation
measures and will submit them
to its related financial institu-
tions late this month.
The measures are slashing
the number of its employees by
1,000, such as by recruiting
voluntary retirees and sending
employees to related ' firms,
reducing costs for cruie oil
imports by modifying import
contracts, selling the Osaka
head office building and stceks
held, and cutting directors'
remunerations.
The company, however,
intends to continue operating
its four refineries.
Even Nippon Oil Co., the
largest in Japan with an access
to inexpensive Aramco (Ara-
bian Americal Oil Co. ) crude
oil, was expected to report
nearly V 20 billion recurring
loss for the first half of fiscal
1981. Also in the April-Septem-
ber period, Idemitsu Kosan Co.
was likely to report V60-80 bil-
lion in loss, followed by Mitsu-
bishi Oil Co. with Y40 billion
and Daikyo Uil Co. with V 25
billion.
A MITI investigation found
that 14 major oil companies'
combined recurring loss totaled
V 165 billion in the first quarter
of this year. Besides the price
and usance (foreign exchange)
problems, these firms are pay-
ing extra for stockpiling. Crude
oil imported in recent months is
being stockpiled in the bunkers
of tankers, which carried the
crude oil cargo.
The stockpiling is costing an
estimated il a barrel a month,
making it a new cost problem.
The imports were not im-
mediately reduced because
contracts had been signed be-
fore the 15 per cent refining re-
duction since July 1.
Oil losses were expected to
snowball - if no price hikes are
possible and yen continues to
be weak against the dollar. As-
suming that the exchange rate
of the dollar to V 230 continues
through the end of September,
the industry will lose V500 bil-
lion in the. exchange loss alone.
The nine major firms' net
worth averaged 5.41 per cent of
total capital as of March, 1981
- one-third of electric utilities'
and steelmakers' ratio of net
worth to total capital.
COPYRIGHT: 1981, the Nihon Keizai Shimbun, Inc.
CSO: 4120/290
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SCIENCE AND TECH.NOLOGY
SIX ALUMINUM SMELTERS TO JOIN MITSUI GROUP PROJECT
Tokyo JAPAN ECONOMIC JOURNAL in English Vol 19, No 964, 21 Jul 81 p 6
[Text ]
1fie six major aluminum
smelting companies here have
decided to join in the joint
developmental research on a
carbothermical aluminum
production method being un-
dertaken by three Mitsuigroup
companies.
The carbothermicai alumi-
num production method, when
practicalized, will open the way
for Japanese aluminum
smelters to strengthen their
international competitiveness
since it uses much less elec-
tricity than the present plec-
trolytic cell process.
The new method uses a blast
furnace and coke as a main
energy source. A special alumi-
num-containing clay abundant
in Japan, coke and a solvent
are fed into the blast Furnace to
directly extract aluminum.
The present bauxite-based
aluminum smelting - process
requires nearly 15,000 kila
watts/hour of electricity per
ton of aluminum ingots
produced.
In order to reduce the elec-
tricity consumption to around
10,000 kw/h, the Japan Alumi-
nium Federation has been
studying an aluminum chloride
process but this study has so
far been not so successful.
The three Mitsui group com-
panies - Mitsui Alumina Co.,
Mitsui Mining & Smelting Co.
and Mitsui Aluminium Co.
thus are developing a blast
furnace process aluminum
production method. They
succeeded in extracting rela-
tively high-purity aluminum in
an experimental blast furnace
last year. They want to con-
tinue the research in collabora-
tion with the Government's
Agency of Industrial Science &
Technology.
The six major aluminum
smelters also wish to partici-
pate in the research. They are
Nippon Lighl Metal Co., Showa
Keikinzoku K.K., Mitsubishi
Light Metal Industries Ltd.,
Sumitomo Aluminium Smelting
Co., Mitsui Aluminium Co. and
Sumikei Aluminium Industries
Ltd.
COPYRIGEiT: 1981, the Nihon Keizai Shimbun, Inc.
CSO: 4120/290
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SCIENCE AND TECHNOLOGY
MITI HOPES TO FORM GROUP TO PROMOTE URANIUM ENRICHMENT PROJECT
Tokyo JAPAN ECONOMIC JOURNAL in English Vol 19, No 964, 21 Jul 81 p 6
[Text]
The Ministry of International
Trade & Industry will try to
have nine electric utilities and
three uranium enrichment
equipment makers form a joint
committee to help promote an
enrichment enterprise with
Australia. The Japanese-Aus-
tralian enrichment venture, as
conceived by MITI, combines
Japan's technology with the
partner country's uranium re-
sources. Most of the enriched
uranium will be supplied to the
power industry here. The joint
venture has been studied by the
two Governments since the top-
level agreement in November,
1974.
The committee of 12 com-
panies will serve as a core once
the joint enrichment venture
plan was finalized hetween
Tokyo and Canberra. MITI
wants to start feasibility stu-
dies with Australia. Their co-
operation until now included
submitting by Japan of tech-
nical information. Encouraged
by possibilities of collaboration,
the Australian Government in-
structed a 4 company enrich-
ment gcoup to start detailed
feasibility studies.
MITI envisages joint feasibil-
ity studies, with the Japanese
participants slated to include
equipment makers, Mitsubishi
Heavy Industries, Ltd., Hitachi
Ltd. and Toshiba Corp. The
Ministry believed that, al-
though Canberra is interested
in feasibility studies with Euro-
pean companies, Japanese will
be picked up as partners pri-
marily because of planned sup-
ply of enriched uranium to
utilities here.
The plant to be sited in Aus-
tralia will have an initial
capacity of 300 tons separative
work units a year. One ton SWU
is equivalent to consumption of
fuel by a 10,000-kilowatt atomic
energy plant for one year.
COPYRIGHT: 1981, the Nihon Keizai Shimbun, Inc.
CSO: 4120/290
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MITI PLANS TO DEVELOP QUALITY ROBOTS
Tokyo JAPAN ECONOMIC JOURNAL in English Vol 19, No 964, 21 Jul 81 p 7
[Text]
The Ministry of International
Trade & Industry has report-
edly started ptans to intro-
duce a seven-year Y30 billion
national research and develop-
ment project, beginning next
April 1, to develop "intelligent"
robots, including one that
assembles a machine, a me-
chanical "seeing-eye," an
earth digger, a nuclear power
plant builder, a space factory
builder, and an ocean develop-
ment floating plant builder. A
new research and development
group to be created by MITI
will be responsible for the "na-
tionally important major tech-
nology development scheme,"
sources close to MITI said.
Initial key study themes
include development of small,
lightweight devices to make the
limbs and other active mecha-
nisms of each robotand sensors
to make such seeing, hearing,
speaking and other sensing
systems, as well as control
systems and language under-
standable to humans.
The popularity of indu.strial
robots has been picking up such
a momentum in Japan that in
fiscal 1980 domestic industrial
robot production shot up 85 per
cent in value over the year
before to total V78.4 billion.
The annual growth in output is
expected to keep rocketing up
by an average of at least 50 per
cent until 1990 to build Japa-
nese robot production into a
~ 1,000 billion industry.
MTTI has seen the need for
more adaptability of robots and
wider application, such as to
general office and even house-
hold and personal uses. It also
sees the need to build robot tech-
nology and to pull away from
past reliance on imported West-
ern knowledge.
COPYRIGHT: 1981, the Nihon Keizai Shimbun, Inc.
CSO: 4120/290
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SCIGNCE AND TECFiNOLOGY
FUJITSU FANUC TO USE FIBER OPTICS FOR NUMERICAL CONTROL WITH SIEMENS
Tokyo JAPAN ECONOMIC JOURNAL in English Vol 19, No 964, 21 Ju1 81 p 7
[Text]
The world's first attempt "to full-fledged computer.
appl}� modern fiber optics to the 7be System X will also be far
production of numerical control etter in cost-performance than
systems is being planned by the best conventional NC
Flijitsu Fanuc Ltd. of Tokyo, it devices. 'Itie magnetic bubble
was recently learned. Machine memory "brain" has a huge
tools can be commanded by memorizing capacity.
flashing light through hair-thin pn top of this, all its instruc-
plastic fiber lines. tions to many machine tools
According to the top-rated under its control, including
Japanese maker of NC sys- transmitting commands,
tems, it has decided to try the receiving information and
venture on its proposed joint giving corresponding instruc-
product with Siemens A.G. of tions, with accompanying input
West Germany. and The "System X," now being hanuopera orV~w 11 be done
devaluped at iLe, laborat-y iprough a fiber optics sysl,em.
under an extensive tech- ~ the case of telephone com-
nological cooperation pact with
Siemens, will be an innova- munication, a single optical
tional NC system that could be ~lber line is capable ot trans-
called "a second generation" of mitting 100,000 circuits of con-
such facilities. lt will also be tact, pertectly free from the ef-
useful for controlling all sorts fects of externai electric cur-
of industrial robots, for which rent or pressures usually jar-
demand is now explosively ring the conventional telecom-
mounting both in Japan and ab- munication wires and cables.
road. Such fiber lines will be sed
The System X, with a built-in on the new NC system for the
microprocessor of the 16-bit decided benefits of
parallel processing type, cur- simultaneously sending various
rently the most advanced, in- information, promising struc-
d u s t r i a l 1 y a p p 1 i c a b 1 e tural miniaturization of the
specialized midget computer, whole NC system, and isolating
wi11 have a high enough the system from jarring elec-
capacity to equal that of the trical and other workshop im-
minicompater, the smallest pact.
COPYRIGHT: 1981, the Nihon Keizai Shimbun, Inc.
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SC?ENCE AND TECHNOLOGY
STEADY GROWTH IN EXPORTS OF AUTO KITS FOR KD ASSEMBLY REPORTED
Tokyo JAPAN ECONOMIC JOURNAL in English Vol 19, No 964, 21 Jul 81 p 8
[TextJ
~
Japan's exports of auto-
mobile kits ior uverseas knock-
ed-down production are
stcadily increasing in contrasl
with a lull in exports of
completed cars.
Statistics show that KD kit
exports in the January-May
period o[ this year totaled some
203,100, up 16.4 per cent from
the same term of last year.
tlonda's exporls o[ KD kits,
though small, swelled by 3.3
limes over a year earlier.
Similarly, expurts by Nissan
Molor and Mitsubishi Motors
increased by 2e.9 per cent and
19.7 pcr cent, respectively.
Exporls of KD kits look a
cunspicuous upturn in March.
Ailer dropping by 10.7 per cent
in January and rising by 12.6
per cent in February, exporls
in March climbed by 252 per
cent, and in April burgeoned by
41.4 per cenl.
Behind the gain in KD kit
exporls is the industrywide
efforts to meet the policies of
developing countries to pro-
mote more nationalization of
automubile prcxiuction.
South Africa and Mexico, ma-
jor KI) kit destinations, place a
ban un imports of finished cars
as a rule. Also, 7'aiwan and Aus-
tralia put domeslic production
ratiu lo imported contents at 70
pxr cent and s5 per cent, re-
spectively.
H:xports of KU Kils by hlukcr
Jan. May
Makrr
1978
1979
1980
1991
N issan Motor Co . .
_ . . _ . , . . . _ . 148,925
178,746
183,492
87,767
Toyota Motor Co. .
. . . . . 70,610
78,510
87,910
36,690
Mitsubishi Motors Corp
11,776
64,250
76.716
72.580
Toyo KogYO Co . . . .
. . . . . . . . . . . . . . 55,060
65,180
71.120
34.060
Honda Motor Co. ,
. . . . . 6.100
5,400
71000
8,560
Fu{i Heavy Industries, Ltd .
8,450
17,700
91500
3,500
Others
-
300
570
-
Total
330,321
I0I,066
139.668
207,157
COPYRIGHT: 1981, the Nihon Keizai Shimbun, Inc.
CSO: 4120/290
29
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SCTENCE AND TECHNOLOGY
NOR OFNI('IA1, l1SN: ()NI.Y
SEMICONDUCTOR COMPANIES EYE GREATLY INCREASING SEA DEMAND
Tokyo JAPAN ECONOMIC JOURNAL in English Vol 19, No 964, 21 Jul 81 p 9
[Text]
Major Japanese
semiconductor mak-
ers are going !o step
up production of
integrated circuits in
Southeast Asia to
meet rising demand
in local market.
Japanese-Affiliated Semiconductor
Plants in Southeast Asia
Date ot
establish- Number ot
ment employees
Hitachi Semiconductor
(Malaysia) Sdn. Bhd. .
Toshiba Electronics
Malaysia Sdn. Bhd.
NEC Malaysla Sdn. Bhd.
NEC Singapore Pte. Ltd.
Southeast Asia is Matsushita Denshi
emerging as a ( 5ingapore) Pte. Lttl. .
promising semicon-
ductor market as many Japa-
nese, American and European
firms locate their plants there to
assemble a variety of consumer
electronics.
Greater semiconductor
production by Japanese-af-
filiated companies is expected
to stimulate "fererunners"
mostly affiliated with American
interests. This indicates possi-
bility of the so-called Japan-
U.S. semiconductor "war"
spreading to the Southeast
Asian market.
Hitachi, Ltd., Toshiba Corp.
and Nippon Electric Co.
(NEC) have a plant in Malay-
sia, and NEC and Matsushita
Electronics Corp. operates one
in Singapore.
Flilachi Semiconductor
iMalaysia) Sdn. Bhd. has
Nov.. 1972 1,500
� � � Mar., 1974 11000
July. 1971 1.200
� � � May, 1976 250
Dec., 1978 300
started manutacturing 16-kilo-
bit random access memory
(RAM) chips to replace a part
of their production in Japan. As
it also produces silicon trans-
istors and bipolar ICs, the pro-
duction value of the Malaysian
plant will reach * 7-8 billion
this year, compared to V 6
billion last year.
Matsushita Electronics plans
to have its Singapore sub-
sidiary double monthly output
of bipolar linear ICs and small-
signal transistors to 5 million
and 30 million units, respec-
tively. Most of the products will
be supplied to Matsushita-af-
filiated plants in Southeast Asia
which produce color TV sets,
radios, tape recorders and
stereo sets.
In contrast, NEC has been
marketing semiconductors
COPYRIGHT: 1981, the Nihon Keizai Shimbun, Inc.
CSO: 4120/290
30
FOR OFF[CIAL USE ONLY
produced in Southeast Asia to
local consumer electronics
makers affiliated with Amer-
ican and European capital, in-
cluding N.V. Philips. NEC
Malaysia Sdn. Bhd. will boost
output of transistors to 50
million units monttily from 36
mi!lion units and that of house-
hold linear ICs to 13 million
units from 10 million units. The
Malaysian subsidiary will new-
ly take up production of indus-
trial linear ICs - several
million units monthly.
NEC Singapore Pte. Ltd. will
build a transistor manufactur-
ing plant with a floor space of
6,600 square meters in order to
further increase production.
Toshiba plans to invest V700
million in its Malaysian sub-
sidiary to boost output of small-
signal transistors to 40 million
units monthly from the present
30 million units and linear ICs
to 3.5 million units from 2
million units. The increased
output at Toshiba Electronics
Malaysia Sdn. Bhd. will be
shipped to Japan to meet rising
demand mainly from video
tape recorder makers.
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SCIENCE AND TECHNOLOGY
FOR OFFICIAL USE ONLY
NEW WAY FOUND TO SEVER SUPER THICK STEEL PLATINGS UNDER WATER
Tokyo JAPAN ECONOMIC JOURNAL in English Vol 19, No 964, 21 Jul 81 p 17
[Text]
A new way to cut underwater
very-thick steel platings cover-
ed with stainless steel, be-
lieved to be effective for both
marine engineering jobs and
for dismantling radioactive
steel structures of nuclear
power plants, has been de-
veloped by the Government's
Industrial Research Institute,
Shikoku, of the Agency of In-
dustrial Science and Tech-
nology, it was recently learned.
According to the institute at
Takamatsu, a regional re-
search arm of the agency be-
longing to the Ministry of Inter-
national Trade and Industry,
its new achievement follows
earlier development of a simi-
lar underwater cutting method
for e:cceptionally thick stainless
steel plating, such as is used for
fast-breeder reactor pressure
vessels. The new method con-
sists of two stages, first cutting
a groove through the stainless
steel coating of very thick steel
plating, and then oxidizing the
gas cutting of the parent steel
plating.
Apart from marine engineer-
ing, such underwater disman-
tling of unused N-power plant
structures has become neces-
sary in Japan, as in all other
nuclear power developing
countries, because underwater
cutting is the only safe way to
separate such bulky structures
for ultimate dumping. In build-
ing a new N-power station by
pulling down a disused one,
simple wrecking in the atmos-
phere poses the danger of
spreading radioactivity.
Various ways of cutting tsed
N-power plant steel plating
have been developed in the U.S.
and in Japan, including a
water-jet method, an are saw
method, and a plasma-cutting
method. An American-de-
veloped plasma-cutting method
applied to a research nucleaz
reactor has reportedly worked
in cutting underwater a 76-mm-
thick piece of stainless steel-
clad steel plate.
Japan's Ishikawajima-Hari-
ma Heavy Industries Co (IHI)
has developed its own under-
water plasma-cutting method
to sever 2 mm-thick steel plat-
ing at a speed of 2 meters a
minute. The company plans to
improve its method and apply
it to dismantling an unused N-
power plar.t material testing
reactor of the governmental
Power Reactor & Nuclear Fuel
Development Corp. But the
plasma-cutting method is said
to have become deadlocked in
the U.S. because it cannot cut
through steel plating of 130 mm
or thicker. Research reactor
plating is ustially thinner and
easier to cut, but commercial
reactor types reach anywhere
between 150 and 300 mm in
thickness.
According to the government
institute, it developed its own
method after studying the
plasma-cutting method and an-
other promising way known as
the powder method. 'ltie latter
is to mix powdered iron in an
oxygen gas used for cutting and
do the severing job by the heat
of chemical reactions occurring
between dxygen and dustiron
and also collision of the dust
iron with the surface of the
steel plating. The plasma
method is to generate an elec-
tric discharge arc between a
tungsten electrode and the steel
plating and cut by strongly con-
centrating the arc. But the
powder metlwd has been found
to have a frequent trouble of
the heat-producing point be-
coming wet and inhibiting the
dust iron flow. 7be plasma
method has been found to pose
the danger of electric shock
when the arc voltage has to be
sharply raised for thicker plat-
ing. Besides, a shielding gas of
argonne or helium needed has
been found to be hard to re-
claim because it catches much
radioactivity.
31
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'1'he institute's oxygen gas
cutting method essentially util-
izes the heat of oxidizing reac-
tions between oxygen and
softer steel making up the
parent material of stainless-
clad steel plating. But the
stainless steei covering ot-
structs cutting because its
chromium content reacts with
oxygen to produce chromium
oxide, a substance with a high
melting point.
The institute thus has devised
the two-stage method to lay
either a rod of carbon or a
piece of soft steel wiring on the
stainless steel, and create an
electric charge arc in between.
A11 resulting molten metal is
swepNaway by jets of water. A
groove is thus dug through the
stainless covering. 'lhen the
parent steel plating, after being
pre-heated with a mixture of
oxygen and hydrogen (or
acethylene) gases, is cut off by
the oxygen-soft steel chemical
reaction heat.
To keep water fronn the pre-
heating and cutting section, a
strong circular ctwtain of water
jets is spewed ;hrough a ring of
nozzles. Inside that ring, there
is a pre-heating gas nozzle and
a cutting gas nozzle. The whole
extraordinary underwater
"torch" is made easy to ignite
by creating sparks of a high-
frequency electric current be-
tween an electrode tip and the
torch tip.
The new method has so far
proved so effective as to clean-
ly cut off 150 to 250 mm (15 to 20
cm) thick stainless-clad steel
plating. It enlarged, the torch
could cut through even 300 mm
thick ones.
COPYRIGHT: 1981, the Nihon Keizai Shimbun, Inc.
CSO: 4120/290
32
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SCIENCE AND TECHNOLOGY
NIPPON KOGAKU DEVELOPS UNIQUE INDICATOR FILM
Tokyo JAPAN ECONOMIC JOURNAL in English Vol 19, No 964, 21 Jul 81 p 17
[Text]
A thin chemical compound
type of electronic illumination
filming that has prospects of
becoming a new indicator
material by offering cleaz
visibility in all directions has
been developed by Nippon Ko-
gaku K.K.
The Nikon camera and optical
instrument maker said the
new filming formed of some
chemical compounds, con-
taining nickel and tungsten,
was developed on the basis of
an idea of Prof. Yoichi Mura-
yama of Toyo University, as
the company's technology
development service for the
semigovernmental Research
Development Corporation of
Japan.
The company said it had been
well known that such chemical
compound filming coming in a
transparent condition, when
chazged with electricity, such
as 1 to 2 volts, emits a very
strong blue-colored light, but if
not electrified, it remains quite
transparent. Thus, utilization of
such filming for cameras,
microscopes, watches, elec-
tronic calculators and many
other indicator-requiring
products had been envisioned,
but it had been technologically
difficult to produce such
filming of just a few microns in
thickness and a transparent
electrode.
'Itie company solved the
problems by develuping its own
"Ion Plating Process" to
produce such compounds of
high precision by heating up
materials with a high
frequency electric coil as well
as - its own new method of
making a transparent elec-
trode. -
The resultant product proved
to be incomparably stronger in
color shade than the liquid
crystal display devices, in addi-
tion to its visibility from any-
where.
Its luminescence comes from
two layers sandwiching an
insulation layer, with the lower
layer made of nickel hydroxide
to light up by an oxidizing
reaction and the upper layer
tungsten oxide by a reducing
reaction. But the new product
still leaves one technical
problem to be solved - 10 to
100 times as much time as the
liquid crystal to react to elec-
tric chazging.
COPYRTGHT: 1981, the Nihon Keizai Shimbun, Inc.
CSO: 4I20/290
33
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SCIENCE AND TECHNOLOGY
LASER BEAM BOMBARDMENT USED FOR FILMING WORK ON SEMICONDUCTORS
Tokyo JAPAN ECONOMIC JOURNAL in English Vol 19, No 964, 21 Jul 81 p 17
[Text]
A simple, [ast, and sure
method o( forming oxidized
filming on the sur[ace ot semi-
conductor substrates by means
of Iaser beam bombardments
has been developed by a tech-
nical college research team.
Accorciing to the team, led by
Prof. Tetsuro Nakamura, of
1'oyohashi University of Tech-
nology o[ Toyohashi City, de-
mand far gallium-arsenic
(GaAs) semiconductors has
been growing, such as for use in
very high-speed computer elec-
tronic elements, laser sernicon-
ductors, and light-emitting
diodes (LEUs).
But it had so far been tech-
nologically difficull lo form a
uni[orm quality type of the
oxidation filming on the surface
of the GaAs semiconductor
hecause of its hvo chemical
composition, it says.
To dcal with this, two
methods, heat oxidation and
pl:isma oxidation, had so far
bcen used. But il had still been
difficull to obtain really,
reliable semiconductors of the
typc.
The new method, though slill
at the laboratory stage,
promises high applicability as
a very simple, swift, and un-
failing method.
A number of such semicon-
ductor substrates are placed in
a box. Atter a vacuum is [orm-
ed, the box is filled with oxygen
gas to anywhere between one
and [ive atmospheres in
pressure. All that remains to be
done is to flash a laser beam a
tew times upon the substrates
through lhe box's glass win-
dow.
A pulse type of laser device
flashing its beams like a
camera strobo illuminator is
used. Each ilash lasts only 13
nanoseconds. The electric
power output needed is only one
joule.
Adjusting the degree of
bombardment so that the light
energy density per square
centimeter of the substrate
surface attains about 1.5 joules,
the leam has applied six rouncls
of such beaming to find a 0.2
micron-thick good qualily kind
of oxidized filming [ormed on
the substrate surtace.
I.ocalized oxidalion has been
also possible, and the need for
prehealing the substrale at the
risk of quality changes as seen
in conventional methods has
been eliminated.
COPYRIGHT: 1981, the Nihon Keizai Shimbun, Inc.
CSO: 4120/290
34
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SCIENCE AND TECHNOLOGY
RED LIGHT DIODE HAVING BRILLIANCE OF FIVE TIMES DEVISED
Tokyo JAPAN ECONOMIC JOURNAL in English Vol 19, No 964, 21 Jul 81 p 17
[Text]
A red light-emitting diode
about five times as brilliant as
conventional ones has been
developed by Staaley Electric
Co. of Tokyo.
According to lhe company,
such semiconductors giving off
bright light when electricaliy
charged have already been
commercially produced in
various colors including inira-
red, red, orange, green and
blue. They have been widely
used in electronic indicating
devices or, in combination with
photoresistors, as photo-
couplers between two electric
or electronic devices. But their
generai lack of brilliance and
low eFficiency in large-scale
communication, signalling and
olher purposes, has been a
technological bottleneck to
wider marketing.
Stanley Electric was the tirst
in Japan to break the bottle-
neck by its development, some
time ago, of its own red light
emitting diode made of a com-
pound of lhree elements,
gallium, aluminum and ar-
senic. It generaled 200 milli-
candela at 1.7 volts and 20-
milli-amperes. The conven-
tional gallium-phosphorous or
gallium-arsenic-phosphorous
equivalents are still so low in
brilliance as to have attained
only 10o milli-cd or even less
under the same electric charg-
ing conditions.
This time, the company has
come up with a[ar more
brilliant version. The brightness
is 5 to 10 times higher than its
own last outstanding product.
In converting electricity to
light, the new product has at-
tained about 4 per cent efticien-
cy, compared with only 1.6 of
its predecessor.
The comp.rny has attributed
its new achievement to a
special "temperature dif-
ference (utilizing) multi-layer
continuous liquid phase build-
up" process developed by Prof.
Junichi Nishizawa of Tohoku
University. The secret ot the
process lies in producing semi-
conductor chemical compounds
free from defects. The com-
pany envisions wide application
of its new LED, through some
reduction in its stiil higli cost
and price, to short-dislance
fiber optics communicalion
lines, traffic signals, large
tlicker warning lights and light-
controlled electronic elements.
LED and related equipment
now account for nearly IO per
cent ot the company's annual
sales.
COPYRIGHT: 1981, the Nihon Keizai Shimbun, Inc.
CSO: 4120/290 END
35
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