SCIENTIFIC ABSTRACT BERKOVSKIY, B. S. - BERKUTOV, A.N.

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ACC NRI AM6026923 Monograph URI Yukhimenko, An'at-oliy Ivanovich; Hirabell, Petr Petrovich;* Yefremov.-Ion Ivanovich; Panchenkov,_ A-fi-a-toliy Nikola- yevich; Belinskiy, Vissarion Grigorlyevich;' Kovalic"k, Sergey Vik- torovich; Put.ilitv, Svetoxar Ivanovich; Roman, Vasiliy Mikhaylovich; Hiodushevskaya, Alla Vladinirovna; Tkachenko, Iri.na retrovna; Ivchenko, Vladimi'r Moiseyevich Problems and methods of hydrodynamics of underwater wings and propel- lers (Zadachi i metody.girdodinamiki podvodnykh kryl'yev i vintov) Kiev, Izd-.vo "Naukova dumka". 1966. 158 p. illus., biblio. (At head of title: Akademiya nauk Ukrainskoy SSR. Institut gidromekhaniki) 1,2000 copies printed. TOPIC TAGS: dimension 1 flow, flow measurement, cavitation,.;--I aMation, fluid mechanic: PUR OSE AND COVERAGE: This book is intended for scientific and en- .neering personnel of research and design organizations specializing in high-speed hydrodynanics. The book discusses the hydrodynamics of bodies moving near an open surface, the discontinuity between liquids of different densitites, and the.development of cavitation. There are .Car6 1! 2 NRI AM6028923 - 74 references, 43 of which are Soviet. TABLE OF CONTENTS jabr*idgedli Forewo rd -- 3 Ch, 1. Two-dimensional flow 6 Ch..11.. Three-dia'aniional flow -- 46 Ch. III. Numerical method of calculating the hydronechanical charac- teristics of a foil:.on a digital computer -- 81 Ch. IV.. Fundamentals of the~hydrodynamica of supereavitating propul- Sion systems "- 107 References "'57 suil. CODE: .10 071 SUBM DATRt OlMar66/ ORIG REF: 044/ OTH REF: 030 2/Z L 36471-M ae(m)/Sn(l) W/GD ACC NR' AT6016715 (tj SOURCE CODE: UR/0000/65/000/000/0021/0032 AUTHOR: Barkovskiy, B. S.: Koshavol, V. I.; Z/O ORG: Institute of lRydromeebanics AN UkrSSR Institut gidromekbaniki AN UkrdSR) TITLE: Motion of a thin shape at arbitrary distances from solid and liquid boundaries SOURCE: AN UkrSSR, Gidrodinamika bollabikb skorostey (High speed hydrodynamics),, no. 1. Kiev,, Izd-vo Naukova dumka,, 1965,, 21-32 TOPIC TAGS: fluid fl2y, boundary layer tbeorys hydrodynamic theory ABSTRACT: The plane linear problem of the motion of a thin shape reduces to a singular integral equation of the form +1 k'(x-s)j(s)ds=-2UF(x)-. where T k(x)-Re + e, C 4Fh 2 E-4rh Card 1/2 L 36471-M ACC NR. AT6oi6715 0 The. article considers the cases where Fr-co; Fr-O. Equation (1) than asaumes the form 7(s) -+slpFr x 8 The remainder of the article in devoted to the imatbomatical development of the problem in these terms* Orige arite bant. 4,5 formulas SUB CODE: 209 12/SUBM DATE: 30SOP65/ ORIG REF: 004 2/2 83020 S/181/60/002/008/039/045 A+,11701D B006/BO63 AUTHORS: Berkovskiy, F. M., Ryvkin, S. W., Strokan, N. B. TITLEt The Current-voltage Characteristics of the Blocking Layer of a Germanium ~-n Junction in the Permeable Direction 7A 1A PERIODICALs Fizika tverdogo tela, 1960, Vol. 2, No. 8, pp. 1956 - 1961 TEXTs The purpose of the present paper was to verify Shockley's relation for the current-voltage characteristic of a planar p-n junction: I - PIs Eexp(q~/kT)-lj , where - I + p(O)/(p(O)+no); denotes the voltage applied to this junction, I a saturation current, q elbetron charge, p(0) - hole concent'riat-ion in the base on the p-n j.unction, and n0 equilibrium concentration of electrons iij the base.' The correction factor A considers the voltage drop occurring in the semiconductor. The authors first discuss the theory'and the method of measurement, and describe the apparatus that is-schematically represented in Fig. 2. The square-T)ulse generator7lused was designed by Engineer G. V. Khozov. The current-voltage Card 1/3 83020 The Current-voltage Characteristics of the S/181/60/002/008/039/045 Blocking Layer of a Germanium p-n Junction in B006/BO63 .the Permeable Direction characteristics of the p-n junctions were taken in forward direction and at current densities of up to 800 - 1000 a/CM2. For this purpose, the' authors used the method of dividing the voltages into those in the semi- conductor and the Volume charge region according to their relaxation rates. A correction for the Dember emf ip carried out (it takes into account the different mobilities of electrons and holes). The voltage- current charaoteriatics-measured on diodes and intrinsic p-n junctions are shown in diagrams. Furthermore, the authors examined molten germanium diodes with a high-resistivity'starting material (n 0-w4.-' 6.1013CM-3 for which P - 2 at a voltage of-100 - 150 mv on the p-n Junction. Theoretical studies have shown that the functions ln I . f(~) should be straight lines, and that the cotangent of their angle of slope should be N/ equal to kT/q; thus a voltage of 25.6 mv is obtained for t - 20 C. The V theory is well confirmed by experimentst 26.5 0-5 mv was obtained, Fig. 4 shows the characteristics obta ned for sample of n - 4.10 13CM-3 at different temperatures between -77 and +70 C. The numerical values Card 2/3 The Current-voltage Characteristics of the Blocking Layer of a Germanium p-n Junction in the Permeable Direction 83020 S/181/60/002/008/039/045 B006/.BO63 pertaining to this diagram are compiled in a table. Shockley's formula is well satisfied in this temperature range at current densities of 2 2 0.1 - 100 a/cm . From " 100 a/cm onward, the voltage on the p-n junctions is saturated. Its maximum value is 60 - 70 mv lower than the contact potential difference. The authors thank V. 1. Stafeyev for his, discussions. Yu. A. Kontsevyy is also mentioned. There are 5 figures, I table, and.13 referencest 6 Soviet and 5 US. ASSOCIATION: Fiziko-t6khnicheskiy,institut AN SSSR Leningrad 'Institute of Physics and Technology of the AS USSR. Leningrad,,).' SUBMITTEDa February 1, 1960 Card 3/3 89294 9, (14 &o // 3 21 3 f g) S/181/61/003/001/033/042 V, V1 77 B102/B204 AUTHORSt Berkovskiy, P. M., Ryvkin, S. M., and Strokan, N. B. TITLEs The effect of adhosion levels upon the relaxation of a ctxrrent pusaing through an n-p function PERIODICALs Fizaka vverdogo tela, v,. 5, no. 1, !961, 230-255 TEXTa The i~nergy levels in the 'forbidden band of' a semiconductor, which trap free oarriers, are divided into two typesy recombination levels and adhesion levels; in the latter, the carriers are held back for some time, after which they may earape into the band,. A atudy of' relaxation curves furnishes dat'a oil the adnf-aion-eenter parameters, suoh as trapping cross ~Y section, concentration, pos,ition in the forbiddon band, and duration of the entablichment, of thermal equilibrium in the band. Tn tile present paper, tne effect produced by a(illesion lovels upon Lhe kinetics of a current pasaing throagh the p-n jimetion is studied,. Investigations were carried out for the short-cirouit current of a pfloto-diode4 the results obtained, however. hold also for other devicea conta.,ning a p-n junction. L photo-42.ode with n-ty-pe bacie ras studied; the electron-bole pairs formed Card, 1/6 SAY,,% 1/003/001/03 3/04 2 The effect of adhesion... B102/B204 during irrada.ation diffused to the junction, where they wore separated by the contact field and thus generated a current in the outer circuit. In germanium, adheaion usually occurs at t 0C, and therefore the "tails" characteristic of adhesion ehould be expected at low temperatures also for the relaxation curves of the photo-diode current,, Howtver, no diminished relax&tlon rate could be obs-~rvad either on Ge or 91 photo- diodes down to nitrogen temperatures. PhDtoconduction and short-circuit current of the photo-diode were measured simultaneously on the same specimenj the experimental arrangement ia chown in Fig. 1. The n-type ge7manium specimens (3-5-15 mm) had two ohmic and one indium contact (p-n Junction). The signals coming from the resistor were observed on an oscilloscope. Fig. 2 shows a typical osaillogram recorded at nitrogen temperature (duration of pulses,~-_i5O j6seo),, The photoconduction relaxation curve contains a "quick" and a marked "slow" part. The latter is related to the adhesion of carriers (Fig. 2a)~ The short-circuit current had a constant relaxation time approximately equaling the life-time (2b); none of the seven specimens of different sensitivity showed a relaxation that was characteristic of adhesion (i.e., long tails)., A theoretical study of relaxation due to adhesion was carried out proceeding from the Card 2/6 89294 3/181/61/003/001/033/04? The effect of adhesion..'. P_102/B204 Af fundament*al relatio'ne kT V Pe A dlp -=PkIl- 7,. (APM- dt dApAr 77~-F = TJ, (APM7'A~AX)i an = AP 'with the denotations to-be seen from Pig. 3, on the assumption that the f illing of the adhesion centers with minority carriers (holes) is in- If only minority carriers participate in the current of the photo-diode, it suffices to determine Ap(t). The following is found. I Ap-f)kI-r[l-,rm-rexp(-(t--r)-~- 3~v for.the hole concentration in the band p p M and for the amplitude of the slow component one obtains: Ap(t-OD )-AP(t "r) &p r~Mr ~C 1 . For the case of bipolar photoconduction, L\P(t-OD -a nd for and in the presence of A-typeladhesion levels, formulas are also fo Card 3/6 89294 S/181/61/003/001/03-3/04? The effect of adhesion... B102/B204 An -~Ap.+Ap and a At sufficiently low temperatures, n U P and 8 and the slow component of the relaxation curve of vu n majority carriers makes the main contribution toward steady ooncentration. Investigations showed that A-type adhesion levels practically do not influence the relaxation of the current passing through the p-n junction. The circumstance is important when selecting the material for'devices I supposed to conserve inertia-at low temperatures-. The adhesion-level type may be determined in a simple manner by means of a p-n junction: If the short-circuit current relaxation has no slow component, the adhesion level is of the P-type, and, conversely, of the a-type. A. A. Mamontova 1 is mentioned. There are 4 figures and 8 references: 2 Soviet-bloc and non-Soviet-bloo. ASSOCIATIONt Leningradskiy fiziko-tekhnicheskiy institut AN SSSR imeni akad. A. F. Ioffe (Leningrad institute of Physics and Technology AS -USSR imeni Academician A. F. Ioffe) SUBMITTEDs July 11 1960 Card 4/6 8/181/61/003/001/033/042 The effeot of adhesion... B102/B204* S/1610 16010/,003/011/047/056 (11Y3, HS-O) 310 4713 8 AUTHORSs Berkovskiy, P. Moo Ryvkinq So Moo and Strokan, N. B. TITLEs Effect of adhesion levels on current relaxation in instruments with n-p junctions PERIODICALt Fizika tverdogo tela, v. 3j no. 11t 19611 3535-3537 TEXTs Using the results of another work (ITT, 3, 1, 230, 1961) the authors study the effeot of &~- and ~ adhesions on the relaxation of a current flowing in a junction with a thin base. This case corresponds to real conditions# and is treated by the example of a photo-diode. Only in the case ofo(-adhesions and to)> 8 is If, the relaxation of the photo- currentp retarded by 0 + M/Pv.). to - w2/2Dt where w is the thickness of the base and D the diffusion coefficient; 9 - 1/1-0 vm + M). Por any marked retardation the concentration of adhesion levels M must satisfy the conditions X~ t t /P 0 >/ it(m + P i. so 9 > 1/3,*M. On the basis vm; vM 0 Ff - of published data an estimate for germanium and silicon gives 0 00 S/I 1 61/003/011/047/056 4 JB! Effect of adhesion levels on current B104 B138 8 M>1015 cm-13. This shows that,although important to the kinetics of photo-oonductivity, in most oases adhesion levels do not affect the inertia of germanium or silicon instruments with n-p junctions. Adhesion through the depth of the base will affect the kinetics if the resistance affects the current flowing through it. In these cases inertia 11W.1911 could be detected in silicon at 3000X, and in germanium at 770K. Adhesion levels can also affect other properties of instruments with n-p junctiozBin which there is resistance across the base. There are 2 Soviet references. ASSOCIATIONt Fiziko-tekhnicheskiy institut im. A. F. Ioffe AN SSSR Leningrad (Physicotechnical Institute imeni A. F. Ioffe AS USSR, Leningrad) SUBMITTEDs July 12, 1961 AUTHORS: Berkovskiy, F. ](,, and Ryvkin, 34226 3/181/62/004/002/009/051 B102/B138 S. M. TITLE: Sensitivity of germanium and silicon photoelements in the range of impurity excitation PERIODICAL: Fizika tverdogo tela, v. 4, no. 2, !962, 366-375 TEXT: The authors study the possibility of the occurrence of a photo-emf in the p-n junction in the long-wave range behind the intrinsic absorption band. The theoretical results were checked by an experimental investigation of gold-doped Ge and Si elements. It is shown that photo-emf may arise with impurity excitation in conditions where minority carriers are generated in sufficient quantity. Fig, 1 shows the transitions possible when the semiconductor contains only one kind of impurity and is irradiated with photons whose energy is less than the forbidden-band width. It is demonstrated theoretically that with impurity excitation in general, minority as well as majority carriers are produced if the quantum energy is greater than the half-width of the forbidden band, If it is less, however, only majority carriers are produced. Photo-emf Card 3~ 12 26 S 81/62/004/002/009/051 Sensitivity of germanium and silicon... B102/B138 was observed on Ge p-n Junctions obtained by diffusion of antimony into P-type Ge with a gold concentration of 1015 em-3. From the X-dependence of photoconductivity and photocurrent it can be seen that both cover the region of impurity excitation, Photoconductivity extends farther than photo-emf into the long-wave range. Photoconductivity and photo-emf at t4 A> 2 It are due to the deep acceptor levels of gold, 0.2 ev from the conduction band and 0.15 ev from the valence band. The voltages obtained experimentally are less than the calculated value, but may reach considerable values. For aload resistance of 10 8 ohms at X = 2.3 ~ the emf reaches 150 Mv- For an incident energy of 3-10-5 w, this corresponds to a sensltiv~.ty of 5000 V/w. The p-n junction in gold-doped n-type silicon was obtained by electrodeposition of nickel, Photocurrent and photoconductivity have very similar spectral distribution and occur between 1.5 and 2.5 IL. They are ascribed to the level, 0.54 ev off the c-band which is near to the middle of the forbidden band. As compared with photoresistors, photoelectric signal transformers on the basis of p-n jVnctions have several advantages: low dark current, insensitivity to adhesion levels, independence of external voltage sources. The design of Card 2/0 34226 S/16IJ62/004/002/009/051 Sensitivity of germanium and silicon... 3102/B138 a photoresistor (Fig. 7a) and of a photocell with p-n junction are compared in an, appendix to the paper. W. B. Strokan and L. G. Paritskiy are thanked for discussion and D. V. Tarkhin and Yu. V. ShmartBev for the specimens, V. Ye. Lashkarev, K. M. Kosonogova (Izv. AN SSSR, ser. fiz. No,. 5-6v 1941), G, M, Avakyants and Yu. L. Ivanov are mentioned. There are 7 figures and 7 references: 5 Soviet and 2 non-Soviet. The reference to the English-language publication.reads as follows: J. M, Waddel et al. Proc~ IRE, LO2, part H, 757, 1955. ASSOCIATION: Fiziko-tekhnicheakiy institut im. A. F. Ioffe AN SSSR Leningrad (Physicotechnical Institute imeni A. F~ loffe AS USSR, Leningrad) SUBMITTED: July 29, 1961 Fig. 1, Band scheme with possible transitions. Fig. 7. Photoresistance and photo cell. Card 34 '~' V12 2 (103 34 227 S/18 62/004/002/010/051 B102YI3138 AUTHORS: Berkovskiy, F. M., and Ryvkin, S. M. TITLE: Nonstoady photo-emf at an n-p junction due to majority carriers PERIODICAL: Fizika tverdogo tela, v- 4, no. 2, 1962, 376-378 TEXT: Steady photo-emf in semiconductors is only observed if a po'tential bairier exists and if minority carriers are Cenerated. However, since the periods required to establish the photo-emf of an inhomogeneous semi- conductor may be different, a nonsteady photo-emf may also be observed when only majority, carriers are'generated. The time required for establishment in this kind 'of semiconductor will depend on the lifetime -r and the time for establishment of diffusion-migration equilibrium t/06, which are different. A nonoteady-phot6-emf due to majority-carrier generation was observed at n-p junctions produced by diffusion of antimony into gold-doped 15 -3 P-type Go, with an Au obnoentration of -10 0m . The a~ectral photo-emf distribution is shown in Fig. 2 for steady illumination (a and pulded Card 0 342 27 S/181/62/004/002/010/051 Nonsteady photo-emf at an... B102/BI38 illumination of 10 cps (b). Steady photo-emf stops at ?.8 p. At X> 2.8 ~t., only majority carriers are generated. There are 2 figures and 6 Soviet references. ASSOCIAMON: Fiziko-tekhnicheakiy institut im. A. F. loffe AN SSSR Leningrad (Physicotechnical Institute imeni A. F. Ioffe AS USSR, Leningrad SUBMITTED: July 29, 1961 Fig.' 2 Card 2/2 37808 S/120/62/000/002/039/047 14, 4o/E163. AUTHORS: Berkovskiy, F.M., Strokan, N.B., and Khozov, G.V. TITLE: 7tudy of-the possibility of measurin semiconductor relaxation times of the order of 10-9 see by the phase method PERIODICAL: Pribory i tekhnika eksperimenta,lno.2, 1962, 165-~168 TEXT: A Kerr-cell modulator with sinusoidal I Mcs control signal was used to determine the lag of a fast photot4ode on the basis of phase shift measurements. Two methods 4c~f obtaining the referencewere examined; a photomultlpller detects the same light signal; the voltage applied to the Kerr cell is itself taken as the reference. It is considered that the delay in the photomultiplier itself is not negligible at the valuew-used in the present measurements, whereas the phase shifts In the modulator are negligible.. A constant difference was observed between.the results obtained with the photomultiplier and Ihose based on the Kerr-cell control voltage.of the order of 10-0 sec* ..Pard 1/2 S/120/62/000/002/039/047 Study of the.possibility of ... E140/E163 The precision of the latter methodlis slightly higher and superior for measurements of time intervals shorter than 10"o sec. There are 3 figures. ASSOCIATION: Fiziko-tekhnicheakiy institut AN SSSR (Physicotechnical Institute, AS USSR) SUBMITTED: July 59,1961 Card 2 BMOVSM- 1, F. M. AYMN, S.M. Effect'of the optical racbarging of impurity centere on the kinetics of a phot"Mrs" in germanium,, Fiz,, tver,, tela 5 no.2-.381-385 F 163. - (MIM 16; 5) 1. Fisiko-tokhuicheakiy inatitat imeni A.F.Ioffe AN SSSR, Leningrad. (Photoolectricity) (Germanium) BERKOVSKI 12 P.M.; KASYMOVA, R.S.; RYVKIN, S.M. x Sensitization of photodiodes resulting from optical recharging of impurities. Fis. tver. tela 'no,2024-533 F 163. f. (MIRA 1615) 19 Fiziko-tekhnicheski institut imeni A.F.Ioffe AN SSSR., Leningrad. (Diodes~ (Photoconductivity) L 18718-63 EWP(q)/Wf(m~/Bb~' D JD ACCESSION NR: AP3003910 S/0181/63/005/007/2023/2025 AUTHORSi Berkovskiy. F. M.; "kin, S. M.. TITIE. Impuri toelectromotive force induced by a current ty pho SOURCE: Fizika tverdogo tela, v. 5, no. 7, 1963, 2023-2025 TOPIC TAGS: photoelectromotive force, impurity, induction, absorption band, radiation defect, recharge, electron, hole,;-injection ABSTRACT: A new effect has been discovered at illuminated silicon photodiodes: after passage of a current pulse through the n-p Jtmction in the permissive direc-! tion, the photodiodes prove to be sensitive in a new spectral region for the fundamental absorption band. This relationship is shown,in Fig. 1 (see enclosures The photoelectromotive force has the character of a flash, the amplitude and 'duration of which are determined by the intensity of current or light. Electri- Cal recharging (of electron-hole pairs) is better than optical because the in. jection takes place at a distance from the n-p junction representing the layer Jn which the photoelectromotive force is generated and because nonequilibrium Card 1/: 92V T L 18718-;~63 -ACCESSION NR: "3003910 concentrations can be injected at higher values, the time for c~prginga sample thus being very small. In their work the authors uzed silicoiPphotodiodes with radiation defects formed by gama radiation from C060. M-charge of the levels of radiation defects consequently took place. It is clear that a similar affect' must be observed in other materials with impurities corresponding to deep levels:_! iftellminary experiments have shown that the effect is observed also in Ge photO7 .;diodes that have been exposed to fast electrons. It is felt that the Fesen :need is for more detailed investigation on various materials. "The authors thank: 'Ye. V. Ostroumova and R. S. Kasy*mo for their help in carrying out the experi- "ments. orig. art. has; 2 figures. ASSOCIATION: Fiziko-tekhniebeskiy institut im. A. P. Ioffe AN SSSR, Leningrad (Pbysical and Technical Institute, Academy of Sciences, SSSR) SUMITTED: O9Mar63 DATE ACQ: 15Aug63 ENCL: 01 SUB CODE: PH NO REF SOV: 005 OTHER: 001 1. 6rd 2 BERKMSKIYj, F.M.; KASYMOVA,, R.S. Negative resistanee of irradiated Ge and Si diodes. Radiotekh. i elektron. 9 no.5:SW-901 My 164. (MIRA 17:7) 1, Fiziko-tokhnicheskiy institut imeni A.F. Ioffe AN SSSR. EWT (C A PF -;;2/EW P (q) IEWP b) SD-, -5/AML/L-~D(f ~/P A WO fft ICr- ~7 v; resistance i zA~ neuLrons -an(--. e I PC! T. w L 2132-65 1 "'F A ~ v- , C ~rt i A c, c rr Ti 7) *,r, o, 111, 6 ~E4 L 4(,192-556 Err (Q-Z/_D~Tl ( I )/FWT(m)/T/EWP(-t)/"T1 T,T(c t) I ACC Wt AP6027247 AUTHOR: Berkovskya, K. F.; Berkovaltiv, F. M. ORG: none TITLE: Investigation of a scannistor on a base of compensated germanium SOURCE:. Radiotekhnika I elektronika, v. 11, no. 8, 1966, 1530-1532 TOPIC TAGS: scannistor, ph transition, circuit design, germanium semiconductor, sensi- tivity increase, emission threshold , ilnI966 t70AJWfR?-P-e, ABSTRACT: Recent publications contain informntion on the development of a new semicon- ductive devfte with two n-p transitionry a scannistor, which is a one-line television ima ge -converter'.',' Data have also been published on scannistors made on the base of n-p transitions in silicon. In order to improve the threshold characteristics of the device and to lengthen its spectral sensitivity region, the present authors investigated a scannfstor made on a germaniurn'; base. The increase In the specific resistivity of germanium by the introduction of compen- sating impurities and by lowering the temperature made It possible to develop a germanium scannistor -which, compared to the silicon solid scannistor, has a higher resolving capacity and sensitivity. The device, shown In Fig. 1, consists of a linear n-p-n structure with Card 1/3 UDC: 621, 397. 613 + 621-382.333-33 L 46192-66 1- Add--WR--,) Svc Fig. 1. Scannistor switching circuit (SVG: sawtooth voltage generator; DA: differentiating amplifier) photosensitive n-p transitions. One of the n-layers performs the function of a voltage divider of the battery E0. Upon application of the sawtooth voltage, the triode structure of the scan- nistor achieves commutation of the contour of the injected carriers, generated by the Image contour. Figure 2(a) shows an osofflogram of a signal from a Ge scannistor 1 cm long, on 2/3 t 4619"-66 ACC W AP6027247 which a light strip 0. 1 mm wide Is projected. The motion of the light strip along the scan nistor corresponds to the shift of the pulse along the oscillogram; and Fig. 2(b) shows the oB- cillogram. of a threshold signal subjected to illumination by a flux of 10-3 1u. Orig. art. has: 5 formulas, and 2 figure's.- [26] SU-4)CODE: rCard 3 7, 17 i:1. V. 77 7. (b) .~-fzi J 09.20/ SUBM DATE 2-"2Nov65/' ORIG REF: 003/ OTH REF: 003 rpm 11 ki 0tlW 9 a 0 a a m a OAS JL -A W lee -00 go go 01boodomeW lbambobn d 01POW-Dwifta Wim Vo 00.8 (xsmjwvma Ardeb). sm (3). Ila-121 t A dmwdobm of eqrAmmb in tba manufAMUM of %viml k* liamn~ wW mW in Its bmt-uvallawat wW pb b" lee 00 a . y Ar .00 00 go z 00 Zo* see too aSO-ILA MIALLUNWALLIMSATIORCLAMMAlft too 1 S 1 04 0 0 0 1 9 N 9 43 0 3 9 T 90000 see 000*0900*0#9000 0000 0 0 1 9 9 31 It U 11 If IS 1144 "" W No No a id a P x 8 16 x h 9 4 * a 0 0 'A I L .2 L--&,- A- -4--A -P-A -A- Isq 4!t~ ptt' tool Is , Potclills "00 "opt".1% 'W'11 so 00 The properties of tionel Metal COntainiDg Additions Of BerYliums, 00 Silicon, and Cobalt. T.J. ad F. W. Stapanav (Metallurg ( a 0 LI R .00 00 .- rmajan) Alloys bekee(i on Monel metP4 HOtAllUrgl9t), 1939, (2), PN9 KIn 5 00 8:~' with fin addition of 1% beryllux have a tonsil strength of 160-190 kg./w. 09 #1; and elongations of 5-10% after suitable heat-treabmt. All addition of :9111 ! -. 00 silicon to the Novel metal v1th 1% beryllim further improves the secanical see *0 zi, properties. Cobalt to not a useful addition to this alloy.- No A. loloa- 004, Coo goo so Ike! 00 to ILA NtIALLUCGICAL LIT(IIAILM CLISUPKATWO ilea, T, S.-V 6-6-4- " U n IV N3 11 lit' to to it at o9 d it KID n 1 14 0 *0 K a it 0 * 0 * 0 0 0 0 0 0 0 0 a is e 6011 Le & 0 000 0 60 a 00 * 0 0 0 0 0 0 4 0 0 0 0 0 0 0 0 & 0 0 0 0 0: ~V 11 16 it a a a 31 a a 30 " a II v I M~m *Pape QW-W-W-rw f- A..A-j -fi-AL-1-A-L A- A At c 4. 11- M-AT-k oft 00 0 'Aam 11111, mimckrob~ to thormodeamb ad Compowatice L40& I 0 9 "4Y F- N- S*P"w (TOd6t- ]ad., 1114(~ ILL (6). 13-17: (7), lTfjjj:'-- o ft. z 941- Uk (11. IM; C. Abs~ 1043.87.23.02 0: TIMP th---ktirk p)wm mW thek Jwthmm wtjr ).- jln Humoian.) tbt% a dri"misved for aligy, f 0 ystv- coppvr--~, Rkkoj-4w=jom, nickel-ahminjum, nkk,,), mangstwo, Ord VIWIL4,~, MA Offwl, Of MWot admixturm on them It 00 a I-Iwrti- was studitd. The suitability of vpAmv also." for the pWjjvUw 4)f mmPo'n"I'm wit" MW Ow M16"m bPt"-"l the awfUnIcal. okil"I. as& ArA IAIY*-Olj=liW tit W4 slkV* mW th6r tvmlmWtkm a -s &ko in. 00 3 comilms. SVA rolWq. utd subk-qtwnt machiabW wA of thm a" we diacommuL see bIIALLWKCAL Littlatidt CLAIWKATON 7 -T It in 9 A a 2 0 v U III AV 7D it' Is' A[ it g 01 a it 4c It 0 0,0 090 00 00 0 0 0 0 0 0 0 1. 13ERKOVSKIY, 111. Ye 2. USSR (600) 4. Brucellosis 7. Morphology of the oral mucosa and of the dental pulp in experimental brucellosis in gunea pigs., Stomatologiia, No.4, 1952 9. Monthly List of Russian Accessions, Library of Congress, February- .1953. Unclassified. AUTHORS: Loba2ev, M.I., and Berkovskiy, V.S. 130-58-4-11/20 TITLE: Rolling Spring Strip with Parabolic Edges (Prokatka ressornoy polosy s parabolicheskimi kromkami) PMIODICAL: Metallurg, 1958, Nr 41 pp 20 - 22 (USSR). ABSTRACT: Spring strip with parabolic edges is used in the "Volga", 'Pobeda" and GAZ-69 cars: in spite of its production having started in 1%.?, many technological problems remain unsolved. A major difficulty is the tendency of the strip to be non- symmetrical and the authors discuss the two variants of lateral reduction distribution in existing roll-pass designs (Figure 3). At the Stalin.o- Works, a considerable amount of rejects is due to this cause and when a similar system was adopted at the "Dneprospetsstall" Works the reject proportion exceeded 25%. From an analysis of,the causes of these defects, a satisfactory system was developed (Figure 5) in which the large lateral horizontal components of the roll pressure on the metal centre the strip in the pass and maintain symmetry. The authors give an equation for calculating. the finishing- pass design and describe a simplified system for specifications omitting the edge curvature: in September - November, 1957, 568 tons of spring were rolled on the 325 mill at the Cardl/2"Dneprospetastall" Works with a total reject rate of 2.6%. Rolling Spring Strip with Parabolic EdgeB 130-58-4-11/20 An automatic guide assembly (Figure 8) designed at the Stalinskiy metallurgicheskiy zavod (Stalino- Metallurgical Works) is said to have facilitated parabolic-edge spring- strip rolling: the guides are in the open position except when the top roll of the stand is lifted by the presence of the strip. Finally, the authors criticise the standard specification, GOST 7419-55 (Figure 1). There are 8 figures. ASSOCIATION: Zavod "Dneprospetsstall" ("Dneprospetsstal"' Wom-ks) Card 2/2 18-5X00, 28,1000 77431 SOVIN-6o-i-i4/22 AUTHORS: Lobarev, M. 1. (Chief.of Rclling-Shop), Berkovskiy, V. nior Roll-Pa3s Designer) TITLE: Measures or Improving Technical and Economical Performance Figures of Section M111s PERIODICAL: Metallurg, 1960, Nr 1, PP 30-32 (USSR) ABSTRACT: Reducing mill 825 and section mills 550, 325, and 280 were modernized at "Dneprospetsstall" Plant (zavod "Dneprospetasta 1l"). The plant produces high-speed steel R-18 (similar In composition to U. S. high-speed steel 18 -4-1), Knl2-steel (composition (%): C, 2.00 to 2.30, Mn , 0.35; Si, 0.40; Cr,11.0 to 12.5; Ni,0-15 to 0. . 30; Mo, 0.50 to 0.80; 3 and P, traces), 3Kh2V8-steel (Composition (%): C, 0.30- 0.50; Mn, 0.2-0.4; Si.# ,