SCIENTIFIC ABSTRACT PENIN, N. - PENIZOV, N.

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December 31, 1967
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SCIENTIFIC ABSTRACT
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ElectronIcs - Transttors card 1/1 Pjb. 89 20/40 &1thor-3. -1 P enin., N. Title -1 P~inciples of physics underlying the operation of crystal triodes (trans~tors), ftriOdicgl 1,Radio 10, 27-28 Oct 1954 Abstract The phys.ics principles and characteristics of crystal triodes are described. Two types of triodes are examined.* The (n-p-n) and the (p-n-p) types. TheIfunctional relationship between the amplifying propertiep of tranq~;Ltors and their frequency-characteristics is analyzed. Diagrams. Institution: . ..... -Submitted:: - ------ ------- USSRA'hydics Semiconductors FD-3118 Card 2.11 Pub. 153 - 17/24 Author Kalashnikov, S. G.; Penin, N. A. Title Influence of frequ ney upon the rectifier properties of semiconductors diodes in the case of small variable voltage Periodical Zhur. tekh. fiz., 25, No 6 (June), 1955, 1111-1123 Abstxuct The authors show that the frequency dependence of rectified current in semiconductor diodes with high degree of ionization of admixtures and considerable electrical conductivity of the semiconductor which are operating at small alternating voltage can be explained by the existance of a capacitance of electron-hole transition due to both injection of charge carriers and also displacement current. They obtain simple expressions for the limiting frequency and frequency dependence of rectified current for various regimes of operation, and consider the influence of the characteristics of the semiconductor upon the frequency properties of the diodes. He thanks V. L. Bonch- Bruyevich for discussions. Five references, including two USSR: A. 1. Gubanov, ZhTF, 22, 1952 and 23, 1953- Institution Sutmitted February 15, 1955 . - . 11, ... ? ;, L.. - E = nL ~~- I ~ MM I ~Tl ~ua- --- - ~ . . - F-77-5~ .-I ;~~ . v , - '. ly;., - -- - - . " ~ . , , - . 1 * ~, - -~ -, - L~ 109-8-10/17 AUVIOR: Penin, X.A'. ,TITLE: '__if'fect -of the Recombination Velocity of a Non-rectifying Electrode on the Frequency Characteristics of a p-n Junction for the Case of Small AC 'Voltages. (Vliyaniye skorosti rekombinatsii u ney ,yRryamlyayushchego elektroda na chastotnyyesvoystva p-n-perekhoda dlya sluchaya malykh peremennykh napryazheniy) PERIODICAL:- Radiotekhnika i Blekt.Tonika, 1957, VoI.II, Nr 8, pp.1053 -1061 (USSR) ABSTRACT: A p-n diode, as shown in Fig.1, is considered. It is assumed that the hole region is unlimited while the elec- tron region has a thickness w . A non-rectifying elec- trode, having a bole recombination velocity S is situated at the second boundary of the electron region. The hole region has a much higher conductivity than the electron region and the lifetime of the holes Z in the n-region is-of the same order as the lifetime of ~he electrons 'C n in the p-region'. This assumption is normally true for germanium junction diodes, in which it can be assumed that the whole current is due to the holes. The basic equation of the s_Ystem is given bv exDression 3: Card 1/3 109-8-10/17 Mfect of the Recombination Velocity of aWon-rectifying Electrode on the Frequency Characteristics of a p-n Junction for the Case of Small,AC Voltages. Graphically these formulae can be represented as a function of w or frequenoyp as shown in Pigs, 4, 5 and 6. From the above results it follows that for small base widths the recombination velocity has a considerable effect on the magnitude and thefrequency dependence of the capaci- tance and resistance of a p-n junction. A decrease in the base width and an increase in the recombination velocity' *ts an improvement in the frequency characteristics of perm- a sem&oqDJId%ibtor diode. There are 6 figures and 3 refer- of which are Slavic'. encesy 2 FebraaTy 20t 1957. ILABLE,: Library of Congress. AVA dard 3/3 109-9-13/15 A:(JTHORS:Penin, N.A-, and Yakunina, K.*V TITLE: -re-P-e-ndence of--the Capacitance and Resistance of Alloy Junction Germe-rium Diodes -Pn the Frequency and the Positive Bias OuiTent (Zavisimostlysakosti i soprotivleniya splavmykh germanievykh diodov ot ch6stoty i toka polozhitellnogo smeshoheniya) IMRIODICAL: Hadiotekhnika i Elektronikap 1957, Vol.lIt Nr 9, pp'.1200 - 1210 (USSR) ABSTRACT: It is ass=ed that the equivalent AC circuit of a p-n junction can be represented by a series resistance, r I followed by a resistanceg R(w) 'in parallel with a capaci- tance CD (my- and C 3 where- C D is the so-called diffusion capacitance'and C 3 is the capacitance of the barrier layer. IL 0 and C are given by (Refs'.1 and 2) D + Card~ 1A 109-9-13A5 'Dependence of the Capacitance and Resistance of Alloy Junction Germanium Diodes on the Frequency and the Positive Bias Current. + T (2) 4, 1 C3 C30 Ii in I + 2 (3) "K (-rS 1)] where. m is ~T # is is the saturation current, I is the positive biasing current# T is th 'e lifetime of the holes and V is the angular frequency. Y. is expressed by Eq`*(4) where pr is the hole concentration in the p region and n., is the electron concentration in the n region and n i is the concentration of electrons or holes in ga=anium'. From Bqs-. (1) and (2) it Is shown that Card ?A 109-9-13/).5 Dependence of the Capacitance and Resistance of Alloy Junction Germanii, Diodes on the Frequency and the Positive Bias Current. a(I + is) -i P (9) V2~ from which it is possible to determine the lifetime T at a given I if.the function D is known~, The above lyr theoretical formulae were checked experimental . The following measurements were made: (1) impedance of the diode as a function of frequency at I =.oonst (Pigr.5), (2) relat- ionship betqeen'the real and imaginary components of a p-n Junction at' w = const -(Fig.6), (3) total capacitance of the diode aq a function of frequency for various biasing currents (see Figs.7 and 9), (4) resistance as a function of frequency for various biasing currents (see FigB'.8 and 9), (5 ) resistance and capacitance as a function of I, for various resistiviti-ea of,the diode material (Figs'.10 and 11), function C as a function of I for various types of , FD Card 3A I R 109-9-13/15 Dependence of the Capacitance and Resistance of Alloy Junction Germanium Diodes on the Frequency and the Positive Bias Current. diodes (Fig'.12) and (7) the relationship between R and the total capacitance C for various I . It was found that the measured results are in very goo& agreement with the experimental values. There are 13 figuresl 1 table and 4 references, 2 of wh1oh are Slavio. SUBMITT6i February 20, 1957'. AVAILABLEt Library of Congress. Card 4/4 AUTHORS: Penin, h-A. and Skvortsova, B.Ye. 109-3-2-15/26 TITLE: Impedance of the Rectifying Junction of Germanium and Silicon Detectors at Mtrahl&7 Frequencies (Polnoye soprotivleniye vypryamlyayushchego kontakta germaniyev kh v.~ i kremniyevykh detektorov na sverkhvysokikh chastotakh PERIODICAL: Radiotekhnika i Elektronika, 1958, V0211, No.2, pp. 267 - 275 (USSR). iLBSTRACT: The impedancc was measured by two methods. In the first method, the impedance was determined by measuring the high-frequency impedance, t In the ,q&ik detector (see Ref.1). second method, a special/compensating transformer was emDloyed. The transf ormer , tuned to a given wavelength in such a way as to obt * ~,ransformation ratio equal to unity, was connected at thpAie Tetector holder,. The tuning of ijae trans- former was also arranged in such a way as to compensate all the reactive elements of the equivalent detector circuit. Under these conditions, the load of the coaxial line was equal to the impedance of the rectifying junction plus the series resistance of the semi-conductor wafer. The trimming of the transformer was done by means of three detector cartridges. The measurements were carried out at wavelengths ranging from Cardl/3 30 to 6 cm by means of a coaxial line having a wave impedance 109-3-2-15/26 ImDedance of the Rectifying Junction of Germanium and Silicon Delectors at Ultrahigh'Frequenci6s of 50 9 The investigated detector was situated in a coaxial holder and the capacitance and resistance of the rectifying 'I -Layer were determined by measuring the real and the imaginary components,, x and y I of the rectifying junction impedance. The positive biassing currents employed in the investigations were in the range from 0 to 20 mA. The results are given in Figo. 1, 2, 3, 4 and 5. The curves of Fig.1 represent x and y components for a germanium detector having a soldeied point contact and a resistivity of (-3 = 0.006 gem as a function of the biassing current I ; Curve 1 was taken at a wavelength X = 6.12 cm, Curve 2 at X = 21.2 cm. and Curve 3 at X = 30 cm Curves of x and y as a function of I , at X 6.12 cm, are shown in Fig.2 for the followin val es of 1) 2) 0.02 gem and 35 -,u 0.2 gem. '3 0.006 gem Fig sho~vs the same parameters as in Fig.2, except that the measurements were made at X = 30 cm. Values of x and y as a function of I for a germanium detector fitted with a pressure-type contact are shown in Fig.4, while similar curves for a silicon detector type j:~K-~2 are given in Fig.4. Theoretically, the impedance of a semi-conductor junction can be represented by Card2/3 the equivalent circuit shown in Fig.6, where R, C D and C I can 109-3-2-15/26 Lopedance of the Rectifying Junction of Germanium and Silicon Detectors at Mtivehigh Frequencies be expressed by Eqs.(l), (2) and (3), respectively; in these equELtions, S is the area of the contact, e is the permittivity of germanium, V is the donor concentration in the n-reGion, (pl, is the gontact potential difference and Co = S Yd he, WK An analysis of the above expressions and a comparison nith the experimental results show that the theory is in good agreement with the measurements. The theoretical and experi- mental results are compared in Fie.?. There are 7 figures, 1 table and 4 references, 3 of which are Russian and 1 English. PUBMITTED: May 28, 195? ILVAIIABLE: Library of Congress Oard3/3 1. Germanium-Detectors Measurement 2. Silicon-Detectors 3. Impedance- GOV-109-3-4-12/28 .A'LJTHORS:.Penin_, N,-A,., Rusin, F. S. and Skvortsova, N. Ye. TITLE: Input Impedances of Germanium and Silicon Detectors at Centimetre Wavelongths (Vkhodnyye soprotivleniya german- iyevykh i kremniyevylch detektorov v diapazone.. srantimet- rovykh voln) PERIODICAL: Radiotekhnika i Elektronika, 1958, Vol 3, Nr 4, PP 543-546 (USSR) ABSTRACT: It is assumed that the equivalent input circuit of a rectifier diode can be represented by a parallel input capacitance C. , 4 series inductance L and an RC circuit representing the impedance of the rectifying junction. The elements On and L reDresent the inter electrode capaci- tance cand the whisker inductance of the detector, and they are independent of the currents passing through the detector, The jwiction resistance R and the capacitance C D Plus Cz (see Fig.1) are functions of frequency and the biasing. Card 1/3 SOV-109-3-4-12/28 Input Impedances of Germanium and Silicon Detectors at Centimetre 'Wavelengths currents passing through the junction. The overall input impedance of the detector is expressed by Eq.(l). The elements R, 0 D and C z are expressed by Eqs.(2) and (3), where C S 6 q"d zo ~Pk =8 is the charge capacitance in the absence of an external bias, S is the contact areal (pk is the contact potential differenee, I is the current passing through the contact, Is is the saturation cur-rent of the junction and T, is the effective lifetimes of the charges. Bq.(l) can be used to constr-act the impedance locus of the dotector. The result- ing impedance circle is expressed by Eq.(4); the centre of the circle is given by the coordinates expressed by Eqs.(5) and (6), while the radius of the circle is determined from Eq.(?). Eq.(4) was used to construct the impedance loci Card 2/3 for a germanium detector having a resistivity of 0.006rLem OOV-109-3-4-12/28 -Input Impedances of Germanium and Silicon Detectors at Centimetre Wavelengths for wavelengths of 21, 6.2 and 3.2 cm. The resulting curves are shown in Fig.2. The impedances of the same detector were measured experimentally and the results are also plotted in Fig.2. It was found that there was a good agreement be- tween the calculated and the experimental results. Eqs.(l), (2) and (3) were used to determine the frequency dependence of the detector input impedance and the resulting curves are shown in Fig.3. The author expresses his gratitude to S. G. Kalashnikov for valuRble advice and constructive criticism. The paper contains 3 figures and 4 references, of whicla 3 are Soviet and 1 English. SUBTAITTED: May 28, 1957 1. DeTectors (RF)--Impedance 2. Impedance--Measurement 3. Germanium--Applications 4. Silicon--Applications 5. Mathematics ---Applications Card 3/3 AUTHORS: Penin N.A. and Cherkas, K.V. SOV/109-3-12-8/13 TITIE: -I~luence of Recombination in the Non-rectifying Electrode on the Characteristics of Alloyed Germanium Diodes (Vliyaniye rekombinatsii u nevypryamlyayushchego elektroda na svoystva splavnykh germaniyevykh diodov) PERIODICAL: Radiotekhnika, i Elektronika, 1958, Vol 3, lir 12, pp 1495 - 1500 (USSR) ABSTRACT: The results of an experimental investigation of the effect of the second electrode on the basic properties of alloyed diodes of variable base thickness are reported. The non- rectifying electrode in this experiment was either in the form of an alloyed tin contact or was formed by a thin layer of copper on the surface of germanium. The investi- gations were carried out on alloyed germaniam-indium diodes in which the diameter of the rectifying contact was approximately equal to the diffusion length of the minority carriers. The thickness of the base was such that w/L varied from 2 to 0.1; w is the base thickness whl.le L is the-diffusion length. For each ratio w/L , a zam$er of samples were investigated; these were f itted with the two types of contact. The saturation current uardl/4 of the diodes was measured as a function of w/L for SOV/109-3-12-8/13 Influence of Recombination in the Non-reetifying Electrode on th-i Characteristics of Alloyed Germanium Diodes seve,ral values of the hole diffusion coefficient D and recombination velocity 3 . The results are shown in FigiLre 1. Here, the black dots on Curve 1 correspond to the diodes with copper electrodes, while the small circles on Curve 2 relate to the diodat with tin electrodes. The dep6ndence of the diffusion capacitance of the diodes on the base thickness is illustrated kfor both types of the contact) in Figure 2. The frequency dependence of the diffusion capacitance and thbe resistance of the diodes is 1*11ustrated in Figures 3 and 4. The curves of Figure 3 were taken for w/L = 2 w/L = 0.3 (with a tin electrode) and for w/L 0.3 with a copper electrode; the resistanceBof the same diodes are shown in Figure 4. The frequency characteristiu'-s of the diodes can be xrepr -esented by the so-called critical frequency, which is defined as the frepency at which the value of the rectified voltage kwhen employing the diode as a detector) was reduced to half, in oomprison with the low-frequency value. The measurements of the critical frequency were (;ard2/4 effected by the circuit of Figure 5. The resulting data SOV/109-3-12-8/13 InfluelLce of Recombination in the Non-rectifying Electrode on the Characteristics of Alloyed Germanium Diodes were used to determine the lifetime 'r of the minority carriers in the bulk of the semiconductor. These lifetimes are shown in the table on p 1500 for both types of the electrode, for various values of w/L . The experimental results obtained in this work show that at small base thicknesses, the properties Of p-n junctions depend on the recombination of non-eauilibriuk current carriers in the non-rectifying electro e. In particular, it Was shown that the saturation current of the diodes increases with decreasing w t if the recombination velocity in the second electrode is S ),D/L and decreases if S < D/L It was also found that the capacitance and the resistance of the diodes become less frequency-dependent if the base thickness is reduced. The authors express their gratitude to S.G. Kalashnikov for valuable advice and to A.N.Kovalev for help in the measurements. uard 3/4 SOV/109-3-12-8/13 Influence of Recombination in the Non-rectifying Electrode on the Characteristics of Alloyed Germanium Diodes Thexe are 5 figures, 1 table and 7 references, 4 of which are English and 3 Soviet. SUBMITTED: MaY 5. 1958 L;ard 4/4 PENIf4l 9(4) 24(6)~_._ PHASE I BOOK EXPLOITATION SOV/1765 -Vsesoyuznoye nauchno-tekhnicheBkoye obshchestvo radiotekhniki I elek- trosvyazi Poluprovodnikovaya elektronika (Semiconductor Electronics) Moscow, Gosenergoizdat, 1:959. 222 p. 13,950 copies printed. Ed-. : V.I. Shunshur; Tech. Ed.: K.P. Voronin. PURPOSE: The book Is intended for engineering and technical personnel working with semiconductl-lor devices. COVERAGE: The book is a collection of lectures delivbred at the All- Union Seminar.on Semiconductor Electronics In March 1957. The semina:r was organized by the Scientific and Technical Society of -Radio Engineering and Electrical Communications imeni A.S. Popov. The authors of the lectures have attempted to systematize the basic information on the operation of semiconductor devices. The articles describe the operation and characteristics.aof.crystal diodes and transistors and discuss their application in Various low-frequenoy, high-frequency and pulse circuits. No personalities are mentioned. References appear at the end of each article. Card 11T Semiconductor Electronics SOV/1765 TABLE OF CONTENTS: Foreword Ye.I. Gallperin. Basic Physical Concepts the author discusses the physical aspects of semiconductor ma- terials. He describes the atomic structure of the various ele- ments and presents a discussion of energy levels in metals'and dielectrics. There are 13 Soviet references (including 4 trans- lations). L .N.A._R_eDjn_ Electrical Properties of Semiconductors The author gives a brief description of semiconductors, such as selenium, tellurium, and germanium. Particular attention is paid to the atomic structure of germanium crystals and to con- afiction in crystals with and without impurities. N.Ye. Uvorteova. Somiaonductor Cryotal Diodes The author discusses the construction and operation of point- contact and junction-type crystal diodes. She also presents methods ofMaking rectifying contacts and describes the effect Card 2/7 3 5 25 32 Semiconductor Electronics SOV/1765 of temperature on diode operation. There are 2 Soviet references (including I translation). Ya.A. Fedotov. Triode Transistors 42 The author briefly discusses the theory of junction-type and point-contact transistors. Chief attention is given to the theoretical and operational aspects of junction-type transistors. The author discusses the characteristics of junction-type triode transistors and describes the effect of frequency on transistor parameters. He also describes transistor power amplification and discusses methods of obtaining high operating frequencies. A brief descrIption of junction-type tetrode transistors is also presented. There are 7 Soviet references (including 5 transla- tions). Ye.I. Gallperin. Triode Transistor as an Amplification Circuit Element 87 The author discusses the construction, operation and applica- tion of triode transistors. He describes various methods of transistor-connection and gives expressions for equivalent cir- cuits and transistor parameters. There are 6 Soviet references Card 3/7 Semiconductor Electronics (-including 1 translation). SOV/1765 V.I. Gevorkyan. Stabilization of Power Supply Circuits of Triode Transistor knplifiers 105 The author discusses methods of stabilizing the operation of bias circuits and describes an analytical method of calcula- ting transistor performance. He also presents a graphical method of determining the quiescent point and discusses tran- sistor circuits with automatic bias. There are no references. A.G. Fillipov. Direct-coupled Amplifiers 117 The author describes the operation of d-c transistor amplifiers and discusses their operating characteristics. He also describes methods of stabilizing transistor operation by using 'negative feedback, balanced and bridge circuits. There are 10 references of which 1 is Soviet and 9 English. YU.I. Konev. Triode Transistors in Amplification Circuits of Servo- mechanism Systems 132 The author discusses the application and operation of transis- tors in servomechanism circuits. Emphasis is placed on a dis- Card 4/7 Semiconductor Electronics SOV/1765 cussion of servomechanism transistor components, such as a-e amplifiers, modulators, and phase-sqnsitive amplifiers.' There are ~ references of which 6 are Soviet (Ancluding 1 transla- tion , and 1 English. I A.A. Kulikovskiy..,High-frequency Transistor Amplifiers 151 The author discusses equivalent circuits of high-frequency transistor amplifiers and describes methods of calculatIng their parameters. He describes the operation of interstage resonant circuits and examines the effect of feedback in tran- sistor circuits. He also discusses transistor stability, sta- bilizing networks for the internal feedback in transistor' cir- cuits and the noise factor. There are 15 references.of which 3 are Soviet, 1 German and 11 English. T.M Agakhanyam. Transient and Frequency-Phase Characteristics of ~ Junbtion-type Triode Transistor 173 The author discusses transient, frequency and phase character- istics of jimation-type triode transistors. He also derives expressions for transfer functions for various types of tran- sistor connections and describes the equivalent circuit for high Card 5/7 Semiconductor Electronics SCV/1765 frequencies for a junction-type triode transistor. There are 8 references of which 2 are Soviet (including 1 translation), and 6 English. T.M. Agakhanyan. Triode Transistor Video,kaplifiera 187 The'author di8cusses,linear and nonlinear distortions In tran- sistor vidoo amplifiers and describes circuits with complex feedback and current distributing networks. A brief discus- sion of multistage amplifiers is also presented. There area 2 references, both Soviet. B..N. Kongz)ov. Trigger and Relaxation Circuits Using Junction-type Triode'Transistors 197 The author describes the operation and characteristics of Bym- metrical triggers and multivibrators-using junotion-type-tran- sistors. He also discusses their stability and derives expres- sions for calculating transistor bircuit performance. There are 4 references of which 3 are Soviet ahd 1 English. G.S. Tsykin. Transistor Inverter of D-C Voltages 208. The-author discusses the operation and characteristics of in- card 6/7 Semiconductor Electronics SOV/1765 verter circuits using transistors. ,Special attention lsjgiven to the operation.and design of inverter circuits with a signal generator. There are no references'. B.N. Kononov. Voltage.Stabilizers Using Semiconductor Devices 215 The author discusses voltage stabilizing circuits using sili- con crystal diodes and transistors. He also explains equations for series and feedback stabilization and discusses transistor stabilizing; circuits with temperature compensation. There are 4 references of which I is Soviet and 3 English. AVAILABLE: Library of Congress JP/sfM 5-26-59 Card 7/7 IPTJWOV, Ya.A., otv.red 4ALIPERIN, Ye.I., zamestitel' otv.red.; BARKANOV, N.A., red.; BEAG2LISOH, I.G., red.; BROYDR, A.M., red.; KAIall-ETSKIT, Tu.A., red.; KAUSOT, S.F., red.; ERASILOT, A.V., red.; KULIKOVSKIT, A.A., reld.; NIKCLATBVSKIT, I.F., red.;,_- IN, N.A., red.; STKPA- 0. I.P., red.; VOLKOVA. I.M., red.: A.A., tekhn.red. (Transictor devices and their applications; collection of articles] PoInprovodnikovye pribory i ikh primenenie; abornik statei. Moskva. Izd-vo "Sovetskoe radio.m No,4. 1960. 423 P- (MIRA 13:5) (Transistors) (Electronic circuits) -A 84620 S/181/60/002/010/050/051 31 A6 0 j /3.3 B01 9/13056 AUTHORS: Belova,, N. A., Kovalev, A. N., and Penin, N. A. TITLE: The Effect of Carrier Production in the Blocking Layer ..ch of the Volt-ampere Characteristic Upon the Inverse Brkn J. of Germanium PERIODICAL: Fizika tverdogo tela, 1960, Vol. 2, No. 10, pp. 2647- 2654 TEXT: The authors investigated the effect of carrier production in the blocking layer of the p-n-junction of germanium diodes upon the reverse current. In the first part of the paper, the carrier production in the blockingLlayer estimated, after which the authors discuss the inverse J.B branch of thevolt-ampere characteristic of germanium diodes with nickel impurities. Finally, the volt-ampere characteristic of germanium diodes with a very low resistivity is discussed. The authors summarize their results as follows: The carrier production in the blocking layer of a p-n-junction may significantly influence the shape of the inverse branch of the volt-ampare characteristic, if impurities with deep levels are Card 1/3 84620 The Effect of Carrier Production in the 8/181/66/002/010/050/051 Blocking Layer Upon the Inverse Branch of B019/BO56 the Volt-ampere Characteristic of Germanium Diodes introduced into the germanium. By a decrease of the volume lifetime in germanium, not only in low-ohmic, but also in the case of high-ohmic germanium diodes an influence of the generation current upon the volt- am'ere characteriatic was found to occur. Here the condition is that the P thickness of the blocking layer is of the same order of magnitude as the cliffuBion length of the minority carrier. Ir diodes produced from pure indium melted in germanium and nickelv the production exerts no significant influence upon the reverse current. This is explained by extraction of nickel from that crystal region in which the blocking layer is located. This extraction sets in during the melting of indium as a consequence of diffusion of nickel in indium. For all investigated germanium diodes with a resistivity lower than 0.01 ohm.cm, a consider- able change could be found: the reverse current increases with a do- crease of resistivity and is practically independent of temperature. In the direct branch of the volt-ampere characteristic a considerable increase of the clarrent could be observed at low voltages. This was explained by the tunnel effect in the p-n-junation. The authors thank Card 2/3 Ca,rd 3/3 BOGOMOIA)VA., L.D. [translator); CHEPEIZVA.9 I.V* ltranslator3; PENIV, N.A., red.; MLVKOVAj, Ye,I., red.; BELEVA., M.A., iBkhn.red. [Electron spin resonance in semiconductors] Zlektrormyi spinavyi rezonans v poluprovodnikakh; sbornik statei, Moskva, Izd-vo inostr.Ut-ry, 1962.. 380 p. Translated from tl~t English* (Semiconductors) - (MIRA 15:5) (Paramagnetic resonance and relaxationY #:4r.I EIIJO/E'463 AUTHORS. Anufriyov, D.F., Doldinov-91ciy, S.D., Zhurkin, B.G., 1EopXlovA1ciy, D.D., Penin, N.A. TITLE: Transistor current regulator for electronsagnets PE11IODICAL: Pribory i telthnika eRsperimenta, no.1, 1962, 129-131 TFM A c1nasical curront regulator is describe6using transizitor circuitry for stnbilizing currents 0 to 30 A for electromagnato used in physical exporintanta, The voltage refererico is the drop acroaa a tuanganin tape in an oil bath, cooled by circulating water. This voltage drop is compared'with that from a dry battery. The stabilization faotor per OC is 3.03 x 104. The bandwidth of the regulator ia 20 kc. There are 2 fi&uros. ASSOCIATIONs Fizicheskiy institut AN SSSR (Physics Institute AS USSR) SUBMITTED: may 8, l.961 Card 1/1 L-06430-6 7 . MffW11D JP (c) JD ACC-W,-7 AP60267M SOURCE CODEt UR/OIBI/66/OOB/OOd/ZWW/Z4 AUTHOR: Galkina* T, I.; Ponino He A.; Rassushin, V. A.'~ ORGJ Physics Institute im. F, N., Lebedevj AN SSSR,, Noscow Qizibheskly institut AN SSSa) TITIZ: Determination of the energetic position of the acceptor level of oadrAum 'in indium arsenid SOURCEI Fizika tverdogo telaj, v. 8, no. 8p 1966, 2488-2490 TOPIC TAGS: arsenide, indium, compounds cadmium, ionization ABS'MACT: The ionization energy of cadmium atoms in InAs was determined from -the spec. tral position of the recombination radiation line of indium arsenide diffusion diodas. The observations were made by transilluminationj~hrouyi the n-region of the material., which had an'electron concentration no = 2 x 10 err . It is postulated that the radiation of the diodes arises in the p-region due to radiative capture of an electron from the conduction zone by a neutral cadmium atom. In this case, the spectral char- actoristic of radiation for direct transitions.between the conduction band and the ac- ceptor level is expressed by the formula 9 G(Y) = Y-1 where Y = - - "' + 6--and fiw is the energy of a radiation quantum. It follows -that the maximum of Ue radiation intensity lies at y = 1A, il 01 1 atkvmax = Cd - ca L 06439-67, + kT/2. it was found graphically that C, 0.195 eV. The forbidden gap width ,a of InAsp necessary for the calculation of Ne onizaiion energy of cadmium Cd# was ob- tained from the photoluminescence spectra of InAs at ?SOK. At this temperature, the- forbidden gapwidth of indium arsenide Cd ve 0.405 oV, and the ionization energy of Ca&ium. Ca ot 0.010 oV. Authors thank N. M. Ponomarev and D. A. Vlasov, on the staff of GIREMW9 for providing InAs samples of the highest degree of purity.,/Orig. art. SUB'CODSt 20/ SUBM DATE: 14Fob66/' ORIG REF: -601/ OTH REF: 006 Card 2/2 a~~L/ L 06102--&1 1A-IT(m)/I�'rJP(t)/h'TI !JP(c) JD ACC NRt AF6026709 SOURCE COW"t ult/offfX76-8fo-W - 2473/2473 AUTHORI Galkinas T. I.; Ifornilova, N. B.;. Fenin-, ne-At 7'1 ORGI Physical Instittito im. P. N. Iebodev, AN SSSR, Moscow (Fizichaskiy nat U Ali SSSR) I'l VI MISI Structure of the recombination emission spectrum of indium. arsenide diffused diodes SOURCES Fizika tvardogo tela, v. 8, no. 8, 1966, 24?3-2475 TOPIC TAGSI emission spectrum, indium compound, arsenide, semiconductor diode ANSTRACTZ The spontaneous recombination emission of indium arsenide upon injection of charge carriers through a p-n junction was studied at ?80K and below. qIo diodes wore prepared by diffusing cadmium into -n-type material w-Ith a donor concentration of,, 3.8 x IoI7 cm73. The emission spectrum of a diode imnsersed in liquid nitrogen (780K)~ with a current passing through the diode (2 A and above) was found to change consider-i ably with changing injection currentl as the latter increases, the intensity of the main peak increases 3.1nearly and shifts toward higher energies, whereas the intensity of well-rosolved secondary poaks (0-350 and 0.360 oV) on the long-wavo side of the main peak tends toward saturation, and the position of these peaks is independent of the current. As the temperature is lowered to 24cX, the resolution of the secondary it stiucture does not improve. The main peak (0-380 eV) is attributed to radiative tran-~; Card T NR, ~~769' sitions from the conduation band to the acceDtor level of cadmium. The secondary peaks are thought to b3 fomed in the forbidden band. of InAs an a resot of defects arising upon diffusion of Cd into InAs under conditions where there is a high excess pressure of arsenic (a:bove 0-3 atm), which is usually placed in the ampoule during difli'.asion.. Authors thiWc V. A. Rassushin for discussing tho work. Orig. art. has 1 2 tiguras. SUB CODEs 20/ SUBM aM & 03Feb66/ OaIG REF: 001/ OTH REF: 001 I Card j,'%CC NR: AP6037022 SOURCE CODE:' UR/0161/66/00,9/oli/~445/~447 AUTHOR: Zhurkin, B. G.; Rucherenko, ORG- Physics Institute im. P. N. Lebe(71cv, AN sSSR moscow (Fizicheskiy institut AN SSSR) TITLE: InPluence of uniaxial comprescion on the jump 6.6nductivity in P-Si SOURCE: Fizika tverdogo tela, v. B., no. 11, 1966, 3445-3447 -.TDPIC TAGS: silicon semiconductorp"somiconductor conductivity, pressure effect, activation energy,.temperature dependence ABSTRACT: The purlose of the investigation wan to determine the dependence of the ...al~tivation energiam e2 and e3 on the pressure in p-Si. The measurement, of the elec- tric conductivity vere made in a sample with boron impurity 1.6 x 1018 Caj-3 at pres- sures 0-37 kg/mm2 and temperature 4.2 - 77K. The pressure and the current through the sample were both parallel to the [110] direction. The tests showed that the tem- perature dependence of the conductivity can be represented as a sum of exponentials iii the activation energy, The conductivity with activation energy e1. corresponds to transition of holes from ACC NRI AP7005840 SOURCE CODE: UR/O]A-1/66/068/6i~/~~-50*/35-5-4- AUTHOR: Zhurkin, B. G.; Penin., N. A.; Svarupo P. - MWW06~ ORG. ftsics Institute im. P. N. Lebedev, AN SSSRp Moscow (Fizicheskiy institut All SSSIR) TITLE: Influence of jumplike motion of the electrons on the EPH spectrum of phos- phorus in strongly doped n-type silicon SOURCE: Fizika tverdo(;o tela) ve 8, no. 12, 1966, 3550-3554 TOPIC TAGS: electron inotion., epr spectrums phosphorusp silicon semiconductor, semi- conductor impurityp spxtral liney line width ABSTRACT: This is a continuation of earlier work (FTT V. T, 3204p 1965 and elsewhere) where a strong dependence of the LTR spectra of phosphorus in n-Si on the impurity- atom concentration,, temperaturep and degree of compensation was established. The pre- sent article reports results of research on the shape and width of the central line ir, strongly doped samples as functions of the concentration of the phosphorus atom, the temperatures and the degree of compensation by boron. The samples were grown by the Cuchralski iftethod and the EPR spectra were measured in the interval 2 - 20K with a superheterodyne spectrometer operating at 9.4 GHz. The line shape was analyzed by ccmiparlson with standard Lorentz and Gaussian curves. The results show .that an in- crease of the phosphvms concentration from 4 x 1017 to 1 x 2018 cm73 and of the tem- peiAture from 2 to 2DX produces narrowing of the linep which has a Lorentz shape at Card 1/2 L Ijf, JD I 4"(1o )/EVIT(r.&EVIP(t)&~ -(c) ~,,~MNV_AP5027391- SOURCE -r.ODE-:- -'-UR/01:,91-/65/007/01113188/3193- AIMIOR.*: Penin N. 'Ov, "_,Zhurkin B. G.; NOR 14 -O)EG: Physics ustitute im. P. N. Lebedev, AN__�q�~~, M2_qpq~L. (Fizicheskiy institut A11 SSSR)_ IITLE: The lnfluenci.~ of concentrations of donors.and acceptors on the eigg-tric-gm- dt~ctivity.of high7alloyed n-type silicon SC!URCE,,;. Fiz:f.ka tverdogo tela, v. .7, no. 11, 1965, 3188-3193 TOPIC TAGS: ~electric_conductivity, impurity conductivity,-crystal impurity, impurity. bv6nd, silicon alloy AV$TRACT: An investtgation was made of the influence of the concentration of phos- pb,brus and the degree of compensation by boron on the electric conductivity of a high- alloyed n-type. silicon with weak and strong compensation in a range of temperatures 'fibm 4.2-to 78K., The activation energy cl-of the-impurity conductivity and the activ& 't y of -the hopping conductivity were measured. The measurements were Ip4on energ Orformed on weakly.and strongly compensated silicon specimens with basic impurity 1017 6 x 1017, and 1 x 101 3 IcanceAtrations Nj) of 2 x 8 atoms of phosphorus per cm -.~p~eciihens were cut from noncompensated and compensated parts of the same silicon i5l.ngle: crystal. Compensation was accomplished -by -imtroducing boron into the m6lt Auring the growth of the crystalso The degree of compensation lc,~= Nj~lNb- in the specimens was determined by measuring both the tempera- OC?0101, VA. L 5039-66',- ACC NRil AP5027391 tult the electroconductivi case in the le J! the,_ Hall jeffect. an ty. An incr o: -C I- :-impurity .(boro In silico. alloyed,with Phosphorus changed.the activa- o t!P ens titn n ticin,energy e',, of th(( impurity conductivity more strongly than the corresponding in- CrOasein the phosphc~,rus concentration. A. decrease of the activation energy c, with thti concentration of.phosphorus was observed at-concentrations.-at which a substantial v6rlap, of wave functions of impurity atoms occurred. This overlap caused the bottom 0 7 of~.the conductivity zone todecrease. The strong influence of a minor impurity on the -'aci~ivation energy c1 As limited by the electric. fields oUcharged atoms of minor im- Pjjj,-'ity, which are effective at large.distances. With anincreased concentration of ph6sphorus atoms at a, small degree o ,f compensation, the activation energy E3 of the hopping conductivity increased initially and then at a,concentration above 6 x 1017 cm-3 beltan to decrease. Ata small degree of compensation, the dependence of conductivity on-~~temperature has definite values'for..the activation energies c1 and c2. For in-. st~ince,:.at a strong compensation in specimens with a high concentration of donors, the IL Avation energies el and C3 depend on temperature., This can be attributed to the evirgence of a.strongly fluctuating electric field generated by the charged donors and e rie- [JAI acg~ ptors.', Orig. art.. has: 3 figu s 6 formulas, and 1 table. ~J' SM~ CODE: SS/ '-SU~M-DATt: 16Apr65/.~.ORIG UP:. 002/ '0TH REF: .008/ ATD PRESS: LgRid 212,' 1.5400-66 3C(m)/T/D1P(t)/&-JP(b)/JWA(h) V.11(c) JD/JG/AT hCC NR: AP5027394 SOURCE CODE: UR/0181/65/007/011/3204/3208 AUTHOR: Zhurkin, B G,.; Penin, N. A. ORG:_ P~Ysics institute AN SSSR' Moscow (Fizi;heskiy institut im. P. N. Lebedeva AR SSSR) TIM: Effect.of c(wfipensation on the exchange interaction of donors in heavily d*ped n.- -silicon SOURCE: Fimika tvetOogo tela, v. 7, no. 11, 196S, 3204-3208 TOPIC TAGS: semiconductor theory, silicon semiconductor, epr spectrometry MISTRACT: Analysis Df electron paramagnetic resonance spectra of compensated sili- ccin shows a new compqnsation effect.uhich occurs in heavily doped semiconductors: W hit the exchange interaction of the majority impurity atoms is interrupted in the elea- trical fields of minority impurity charge centers. The authors give experimental data on this effect Observed by the electron paramagnetic resonance method in beavi- lydoped n-silicon w1th a phosphorus concentrat-ton of 1017_1018 cm-3, compensated wi:th boron. Both weakly and heavily compensated specimens were studied. The boro was added to the welt while the Wcimens mwe being grown by the Czochralski method. Gird 1/2 !L 5400-66 Acc HR. AP5027394 C? -The degree of compensation was determined from the relationship between temperature and electrical conductivity in weakly compensated specimens, and by measuring the .Hall effect and electrical conductivity at row temperature for heavily compensated~ specimens. The electron paramagnetic resonance spectrum for a weakly compensated .specimen with a phosphorus concentration of 101 cm-3 at 20K is an isolated line :with a width of 6 oe and no traces of hyperfine interaction. The spin density in ~tbis specimen was reduced by a factor of 'v5 after 80% compensation while the line width increased to 8 oe. The greatest change in.the form of the electron parayfiag.- netic resonance spectrum was observed in a specimen with a phosphorus concentration :of 6.1017 cm-3. In this case, 90% compensation reduced the total spin density by a factor of 1%,10, while the intensity of lines for hyperfine structure was approxi- mately doubled. A theoretical explanation of these phenomena is given based on at- itenuation of the volume interaction of phosphorus atoms in the electric fields of ithe negatively charged acceptors. In conclusion, the authors express their grati- itude toLV. Keldysh for discussion of the results. Orig. art. has: 2 figures, '1~table. !SUB CODE: SS/ SUBM DATE: 28Apr65/ ORIG REF: 003/ OTH FXF: 006 2/2 IJP(e JD ACC NRI AP5021.143 UR/0386/65/002/001/0021/0023 AMHOR: Zhurkin, D. G.; Penin, N. A. TITLE:. Temperature dependence of byperfine Interaction lines in EPH spectra of io 1~bosphor s in pilicon SOURCE: Zhurnal eksperimentallnoy I teoreticheskoy MAL Pis'= v redaktsiyu. Prilozheniye 1 v. 21, no. 11, 19651 21-23 TOPIC TAGSt EPH spectrumi silicon, hyperfine structure, impurity center, wave fu6ction ABSURACT. The,authors investigated the temperature dependence of the s pectra of elt~,ctrdn parami4petic resonance in n-type silicon doped with phosphorus, and observed that the byperTine interaction lines behaved differently in spectra of samples with different .phosphorus concentrations. The measurewents were made at 1two temperatures (2 uid 20K) for samples with donor concentration-2, 4.5, and 6 x 10 7 cb-3. In the Iasi; two sarqplcts the intensity of the hyperfine interaction lines decreased rapidly with increasing, temperature. This difference is attributed to the different nature of the.pa-ramagnetic centers uhich make the main contribution to these lines at differ-- ent phosphorus concentrations* x 1017 ctn73 the hyperfine interaction lines are due principally, to the isolated atoms of the phosphorusi-since the overlap of the wave functions is insignificant at this concentration, At higher concentrations there in consSderable overlapping of the wave functions~ and the hyperfine interaction lines Card 1/2 F77::~ : - , !~ I '--, -"--7~7 F-7-7 ~,77 tj- - - - 'i ~` I --a - ~ U IVENOV) Sergey Pikolayevich; qjgty,.Aeks(UevIch; SKVORTJOVA, Nera Yefimovna; SOKOLOV., Yuriy Fe~~io~ich; VOaOVA, I.M.., red. (Physical principles of the operation of ouperbigh fre- quency semicorductor diodes] Fizicheakie osnavy raboty poluprovodnikovykh SVCh diodov. Moskva;, Sovetskoe ra- dio., 1965. 190 P. (HIRA 18:7) HOW, Sergey, Nikolayevich; PRUN, Nlkday. Alokoeyovich; SKVORTSOVA, Nora iOLOV, Yuriy Fedorovich.- VOLKOVA, I.M.., red. (Physical Drinciples of the operation of semiconductor microwave diodes] Fizicheskie osnovy raboty poluprovod- nikovykh SVGh diodov. (By] S.N.Ivanov i dr. Moskva., Sovetskoe radio, 1965. 190 P. (MIRA 18:5) _!ACCESS.L -ON NR: AP4028hh~ S/aL81/64/006/004/1141/114 MTHORS: Zhurkinj B. Go; Penin., No A. !TITLE- The effect of concentration of Impurity atoms on the spectrum of electron pqramagnetic resonance of donors in silicon 1SOURCE: FUzika tverdogo telaj v. 6, no. Itt 196hi 1141-114 TORIC TAGS: electron paramagnetic resonance2 silicon, impurity atom, doped semi-- conductor, Ozoehralski method.. impurity concentration ABSTRACT: The authors describe the results of studying changes in the EPR spectrum in single ci7stals of Si doped with vhrious concentrations of P or As. Measure- Iments-were made in the temperature interval 2-20K. The crystals were grown by the iftochralski., method., and impurity concentrations were determined by measuring the I jHall coefficient at room temperature* These concentrations ranged from 1017-3.1018 Ict-3. It was found that increase in donor concentration leads to gradual disapp6ar. lance of lines representing hyperfine interaction in.the EPE spectrum and results in,1- "the appearance.,of a single linej the width decreasing with increase in concentratio C~rd :7-77! AP4028443 ACCESSION NR and in temperature, within the limits of the experimental ranges of these two' ..1factors. The observed changes in the EPR spectrum are explained by delocalization. 1of electrons as the impurity band develops and as metallic conductivity begins to appear4 Compression of the single MIR line with increasi~nj concentration 9f As was found to take place at higher concentrations than with P. The nature of ther I ispectral change also indicates'chaotic interaction of t~e impurity atoms. The EFR, Ispectrum shows lines of isolated atomsy lines due to different grouping of atoms associated with exchange interactionj and also lines of mobile electrons. The .-ichaotic distribution of impurities (in forming an impurity band) gives rise to set .'of energy levels near the conduction band., each at a different depth and corra- :sponding to different groups/of atoms, with wave functions of the donor electrons overlapping to various extents. "In conclusion.. the authors express their thanks Ito M. G. Millvidskiy for preparing the single crystals of silica doped with lphosphorus anct arsenice" Orig, arto has, 4 figuro6b'* fASSWINVION: Fizicheskiy inBtitut im, No.Lebodeva AN, SSS11) Moscow (Physical 11natituto AN SSSO Card 2 /3 ---------- ---- CCESSION 14R1 :AP4028h43 A ' ED: S UBM M 03 Nov63 DATE ACQt 27Apr64' INCL: 001 E . i W CODE: ): SS O IW SOV's 000. OTHERt I D05. .Card ACCESSION NR: AP4043402 S/0,181/64/006/008/2558/2560 AUTHORS: Zhurkin, B. G.; Penin, N. A Volkovf M., A. TITLE: Influence of compensation on the form of the epr spectra in n-type silicon SOURCE% Fizika tverdogo tela, v. 6,. no. 8, 1964,'2558-2560 TOPIC TAGS: electron paramagnetic resonance, line broadening, phosphorus, silicon, boron* crystal.growth, spectrometry, impurity content, spin balance ABSTRACT: In vie%4 of the confusion still existing with respect to the distribution of the energy states in the impurity band, the authors experimented with phosphorus-doped n-silicon. The measure- ments were made for three values of the phosphorus concentration: 17 17 18 CM73 2.3 x 10 , 6.0 X-10 , and 1.0 x 10 with the phosphorus concentration in the compensated sample's being equal to the concen Card 1/4 'ACCESSION NR: AP4043402 nsa- tration in the corresponding uncompensated samples. The compe :tion was effected by introducing boron in crystals grown by the !Czochralski method. The samples for the measurements were cut"from icompensated and uncompensated parts of the same single crystal. ~'The experiments were carried out with a superheterodyne EPR sTec- 'trometer at 9.4 Oc and 2K. The results show that at 2.3 x 1;0 7 cr~-3 ithe width of the impurity band is still narrow and probably does 10-4 eV)., At 6.0 x 1017 cffr3-apparently at knot exceed kT (1.74 x 'least 90% of the states of the impurity band lie above the level corresponding to the isolated impurity atoms. This was in contra- diction with the theoretical predictions which call for the states of the impurity band to be symmetrical with respect to this energy 'level. At 1 x 1018 cm73, the compensation decreases the spin con--!, centration by.approximately a *factor 5.and broadens the EPR line to 8 Oe. This indicates that the electrons of the lower states in the .impurity band are.more strongly localized than the electrons of the, higher states'. "In'conclusion the authors are grateful to A. Ni COM 2/4 -khTFRIYEV.. B.F.; DOMIOVSKIY, S.B.; ZHURKINp B.G.; 'IMPYLOVSKIY, B.D.; Transistor current remilAtor for electromagnets. Prib.i tekh.okup. 7 no.1:329-131 Ja-F lk. (MIRA 15:3) 1. Fizicheskiy institut AN SSSR. (Transistor eircuits)(Voltape regulators) 84497 S/1 12,/59/000/014/078/r, 85 AQ52/A001 50- Translation from: Referativnyy zhurnal, Elektrotekhnika, 19,r-9, No, 14, PD. 2~- 251, # 30327 AUVHOR: Penin, P. I. T=,,: Some Properties of the Ideal Signal Receiver With Two Discrete Values PERIODICAL-. Tr. Mosk, energ. in-ta, 1958, 140. 31, PP. 189-195 TEXT: Some properties of the ideal- receivers for the cases of, signals with two discrete values S 1 and S2 are clarified. The values of error probabilitiez of the first (,6,) and the second discrete value q2i ) are derived and investi- gated;: they represent the reproduction of S2 insteai of S1 ~Lnd Of S1 instead of S2- Diagrams showing the relations between ~j and ~jj and distortion probabil- ities caused b the errors/~ and ~J3: at different values of the ratio of a priori probab Ilities ~,, are given. it id shown that ' the effect of the error probability g, at g