SCIENTIFIC ABSTRACT SEDLOEV, IV. - SEDOKOV, L.M.

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CIA-RDP86-00513R001447620008-9
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RIF
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S
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100
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November 2, 2016
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August 23, 2000
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8
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Publication Date: 
December 31, 1967
Content Type: 
SCIENTIFIC ABSTRACT
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..". ~ - - ~ - - . - - - - --- POZDIIYAKOV., B.V... kand.tekhn.nauk; I~ELYUBOV, Yu.V&,,gornyy.inzh.1 31,,'R,DYUKOV, Mathematical Sedmakj Viktor. :Dimension des ensembles partiellement ordonnes Reviews associes Pux.polygones et polyedres. Hrvatsko Prirodoslovno . Vol. 14 Drustvo. , Glasnik Mat.-Fiez. Astr. Ser.11I.. 7, 169.7182(1952). No. 8 (Serbo-Croatian. French summary)'Let F. be., a partially ordered Sept. 1953 Then P.has a,well4defined,dUension, as defined by.Dushnik - Topology mer. JO 'math'! 63t 60.0-610 (1941); these Rev, 3,~ 7f andAilier ZA ' ' Note.that this . dims nsion-19 completely unrelated,to the-dimension . of P as defined b~ 0. Birkhoff rAmer, Math. Sod, Colloq. Publ,p v. 25,'rev. ed.p New Yorkp-1948t P. 11; these.Rev , lop Let II be a polygon or 3-,dimensional polyhedronp andJet P.be the set whose elements are the verticesp.edgeop.and faces (if.II is a polyhedron) of 11. A partial ordering,is defined In P.in the n Ion 5889 G. Birkhoff loc. cit j pp..12- natural way, by set-I clut, 127. Theauthor proves thatthedImen 'sion, of F is 3 if II is a Polygon efid1s. ;~r 4 if II is a 3-dimensional polyhedron... !If ~ 11 is one of the regular polyhedro oris a pyramid orlprism, then, the Aimension..of P is exac.tlY 4. With an, n1dimensional, polyhedron II, there 16 associated a~partially ordered set P'in the tame way;~. c,onsistIng 'of all A-dimensinnal aimplices contained in 11 (k-0# 11 , , ~ 2,,---,n).. The dimerwioL of the partially 'ordered set in this (over) SUB CODE.: ~07, l1/ SUBMDATE: 22MRY66. Card 2/2 7oW SOV11317-58-7-144841 Translation from: Referativnyy zhurnal, Metallurgiyal 1058, Nr 7, p 79 (USSR) AUTHORS- Freydenfel'd, E.Zh., Sedmalis, U.Ya. TITLE- Possibilities of ~ULfTi-7-gt'WK";5f~i~'fa-rnganous Open-hearth Slags for Production of Binder Compounds (Vozmozhnosti ispol'zovanlya tsovistykh martenovskikh shlakov dlya proizvod margan s tva vyazhushchikh veshchestv) PERIODICAL: Zinatil. raksti. Latv. Univ., Uch. zap. Latv. un t, 1957, Nr 14, pp 173-178 ABSTRACT: The open-hearth slags (S) investigated were taken f rom the was Ite of the Liye-paya "Krasnyy metdllurg" [Red Metallurgist plant (the S were prima rily nongranula.ted). A sample of Slot the following chemical composition was employed: 28.37,.SiO2,,. 37.0% CaO, 9 '5% MgO, 9.416 Fe 03, 6.2 2 3 i 7.9% MnO, 2 Al 0 1.5% P205., Eleven. various mixtures were prepared (th6 only addition being sand, sand and gypsum, sand and Po rtland cement sand and CaO and CaC2). It Was found that after being ground in a ball. mill, or a vibrating mill, the nongranulated S of -40 kg/cmZafter-'1` of the plant. indicated exhibit a crb compr. Card 1/2 having been stored in a moist medium for a. period.of 28 days. r, L 26398-66 ACC NRs M50247115 l.' Utilization in electronics - 2, 2., Actual problerm li : 3.' ' Miniaturization and nAcrominiaturization 4., a8 Exanples and corrparisons -II. Reliability problem h.. 1 21 C Ex~erience regarding reliability 22 6. Maj or trends d eccnonical aspects of reliability; 24 an S Ch. IV. Miniature and special. electradc Conpcheilt 27 7. 2 Major trends 7 8. Operating ran of basic circuit 616u6nts ;w~: ,~7~~i 9. 1 nponents 2( Serdeonductor c6 ' Q, Jq#rIc,vacuuin de vices 40 L 26398-w66 ACC.NRi AM50247L3 :18. Ceramte mate --Ials 75 19. Artificial substance 20.'' Special materials ~Ch. VI. Several a&Lievements of m1crominiaturization technology:-.,09 21.1, Chemical depositicn 22.~ Electroplating 86 230 Circuit printing :,86 24. --- eniAsicns and pastes Technology of etching using 25. ; Deconposition by heat 89 26. ~90 :Evaporation in vacuum 27." 00 Vreatuent by electron beam 28. Equiptrent for heatin b 'ele g ~y ctron. borrbardneilt 29 Properties of materials:used for vacuum evaporation:- 101! 30: Cathode s uttering 102 p Production of film an :0103 d coatings 32., mts -J07 Bonding of separate circuit elenL Technology of resis tive materials ;w~113 '34.' Capaqitor production technology 35. Semiconductor elerwnts for m1crominiaturIzation 120 36. Surface coa ng production technolo 121 t 9y : 37. Microphoto:~a 123 phy . 38. Ultrasound procedure 126 77 L 26398-66 ACC NRt N45024745 Ch. VII. RC circuits 12T 39. . Structural prdnciples 128 C . ElenLahts of RC flat circuits.:-., 130 41.: : Morphology and tcpology of the:circuit 147.': -42 . istois and capacitors to those v1se in: Transfer from, classically connected'res 1 -,flat RC circuits 148 43 7 araTmters 154 Circuits with distributed p . . 44. . fafilliarIzation with f6reign products 160 4 5 circuits ~164 Further prospects for utilid~g RC . , -Ch. V desigis 165 In. Module 46. Surface of a Module, carrying board with flat ints 165~ jo 47. Tuee-dinensional mdules consisting of dlassic,element 16 7 ~48. it '171, Tinkertqyll-t~pe module system - 49. , Experinental desigi of various.jmdule systerm IBO 50. s - 185 Vdcromodule 51. Aernmodule ~ unit,,-, 201;_ 52. Proce&mm su sted-for desi ele ctionic devices in rdervm6dules 9EP 3.; :d_ rw -S 211 Practical utilization.of micro AuDe f0= Surface and mItidimnsl Ch. IX. onal Pmctlonal circuits - 2A4 .54. di .214 Trends in solving m1cromIzdature rcuits 55. Two-dirmnsicnal: circuits -,:214 L 26 098--66 ACC NRt AF60247115 . , ;; BI TF " r 7 . -; 17 nj~j !, 'K , . ~,X.; ;;